Pii Carbide Coating

VeTek Semiconductor speciale in productione ultra purum Siliconis Carbide productorum Coating, hae tunicae ad graphites, ceramicos et metalla refractoria applicanda destinantur.

Nostrae puritatis altae coatinges praesertim in usu in semiconductoribus et in industriis electronicis iaculis sunt. Pro tutelae laganum baiulum, susceptores et elementa calefacientia inserviunt, ea custodiendo a ambitus mordax et reactiva, quae in processibus occurrunt, ut MOCVD et EPI. Hi processus integrales sunt processus lagani et fabrica fabricandi. Accedit, nostrae membranae aptae sunt applicationibus in fornacibus vacuo et calefactione exempli, ubi summus vacuum, reactivum et oxygenii ambitus offendit.

In VeTek Semiconductor, solutionem comprehensivam offerimus cum facultatibus machinarum machinarum provectorum. Hoc efficit ut basium componentium utentes graphite, ceramico, vel refractariis metallis fabricare, ac ceramicam SiC vel TaC coatings in aedibus adhibere possimus. Etiam operas efficiens praebemus ad partes suppeditatas, ut flexibilitas ad diversas necessitates occurrat.

Nostri Silicon Carbide Productorum Coating late usi sunt in epitaxy Si, epitaxy SiC, systema MOCVD, RTP/RTA processus, processus engraving, processus ICP/PSS engraving, processus variarum LED generum, inter caeruleum et viridem LED, UV LED et profunde UV DUXERIT etc., quod aptatur instrumentis ex LPE, Aixtron, Veeco, Nuflare, TEL, ASM, Annealsys, TSI et sic porro.

Reactor partes facere possumus;

Pii Carbide Coing multa singularia commoda:

Silicon Carbide Coating several unique advantages

VeTek Semiconductor Silicon Carbide Coating Parameter

Basicae physicae proprietates CVD SiC coating
Property	Typical Value
Crystal Structure	FCC β Phase polycrystallina, maxime (111) ordinatur
Sic coating densitas	3.21 g/cm³
Sic coatingHardness	MMD Vickers duritiem 500g onus
Frumenti amplitudo	2~10μm
Puritas chemica	99.99995%
Calor Capacity	640 J·kg^-1·K^-1
Sublimatio Temperature	2700℃
Flexurae Fortitudo	415 MPa RT 4-punctum
Modulus	430 Gpa 4pt bend, 1300℃
Scelerisque Conductivity	300W·m^-1·K^-1
Scelerisque Expansion (CTE)	4.5×10-6K^-1

CVD SIC CRYSTALLOS STRUCTURA

CVD SIC FILM CRYSTAL STRUCTURE

Silicon Carbide obductis Epi susceptor SiC Coating Wafer Portitorem SiC obductis Satellite operculum MOCVD CVD SiC Coating Wafer Epi Susceptor CVD SiC coating Heating Elementum Aixtron Satellite laganum carrier SiC Coating Epi susceptor SiC coating halfmoon graphite parts

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Calidum zona Graphite calefaciente

Veteksemicon calidum zona Graphite calefacientis est disposito ad tractamus extremam conditionibus in altum temperies fornacis et ponere optimum perficientur et stabilitatem in universa processus ut eget vapor depositione (CVD), epitaxial et altum temperatus anneaxial et altum caliditas annales. Veteksemicon semper focuses in producendo et providing summus qualitas calidum zona graphite calentium. Nos sincere invitare te ut contact us.

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Veeco Mocvd caliginosus

Vetek Semiconductor est ducens manufacturer et elit de Veeco Mocvd Heater Products in Sina. Mucvd calefacientis habet optimum chemical puritatem, scelerisque stabilitatem et corrosio resistentia. Est necessaria productum in metallum organicum eget vapor depositione (Mocvd) processus. Welcome to your porro inquisitione.

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VEECO MOCVD Susceptor

As a leading manufacturer and supplier of VEECO MOCVD Susceptor products in China, VeTek Semiconductor's MOCVD Susceptor represents the pinnacle of innovation and engineering excellence, specially customized to meet the complex requirements of contemporary semiconductor manufacturing processes. Receperint tuum porro inquisitione.

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SID SIB

Ut an provectus SIC sectore pars productum manufacturer et officinas in Sinis. Vetek Semiconducto SIC sectis pars est summus perficientur signa component late in semiconductor processus et alia extrema summus temperatus et alta pressura processibus. Receperint tua porro consultatio.

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Silicon Carbide Wafer Chuck

As a leading manufacturer and supplier of Silicon Carbide Wafer Chuck products in China, VeTek Semiconductor's Silicon Carbide Wafer Chuck plays an irreplaceable role in the epitaxial growth process with its excellent high temperature resistance, chemical corrosion resistance and thermal shock resistance. Receperint tua porro consultatio.

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Silicon carbide imber caput

Silicon carbide imber caput habet optimum summus temperatus tolerantia, eget stabilitatem, scelerisque conductivity et bonum Gas distribution perficientur, quae potest consequi uniformis Gas distribution et amplio film qualis. Ideo solet usus est in altum temperatus processuum ut eget vapor depositione (CVD) vel physica vapor depositione (PVD) processibus. Receperint tuum Praeterea consultationem ad nos, Vetisk Semiconductor.

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Sicut professionalis {LXXVII} Manufacturer et elit in Sina, habemus nostram officinam. Utrum vos postulo customized servicia in occursum specifica necessitatibus vestris regione vel volunt emere provectus et durabile {LXXVII} in Sina, vos potest relinquere nos nuntium.

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+86-18069220752
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+86-579-87223657
E-mail
anny@veteksemi.com
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Wangda Road, Ziyang Street, Wuyi Comitatus, Jinhua urbem, Zhejiang provincia, Sina

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Pii Carbide Coating

Reactor partes facere possumus;

Pii Carbide Coing multa singularia commoda:

VeTek Semiconductor Silicon Carbide Coating Parameter

CVD SIC CRYSTALLOS STRUCTURA

Calidum zona Graphite calefaciente

Veeco Mocvd caliginosus

VEECO MOCVD Susceptor

SID SIB

Silicon Carbide Wafer Chuck

Silicon carbide imber caput

Mitte Inquisitionem

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De nobis

Products

Nobis loquere

Phone

Fax

E-mail

Oratio