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Silicon Carbide Solidae

Vetek semiconductor solidum Silicon carbide est momenti tellus component in Plasma Etching Equipment, solidum Silicon Carbide (CVD Silicon Carbide) Partibus in Etching apparatu includitfocusing annulos, Gas showhead, Tray, Edge Annulorum, etc Ob ad humilis Reactivity et conductivity solidum Silicon Carbide (CVD Silicon Carbide) ad CHLORUM - et Plasma Plasma Etching Equipment Focusing Annulorum et aliarum components.


Exempli gratia, in focus anulus est momenti pars positus extra laganum et in directum contactus cum laganum, per applicando ad anulum ad focus in plasma transiens per anulum, ita focusing ad plasma in laganum ad amplio in dispensando. Traditional Focus anulus factum est de Silicon autquartz, PROLIXUS Silicon ut communis focus anulum materia, quod est fere prope ad conductivity Silicon Wafers, sed penuria est pauper etching resistentia in fluorine, continens Plasma, etching apparatus partibus, ut saepe usus est ad tempus, ibi erit gravis productionis.


Solid sic focus circulumOpus

Working Principle of Solid SiC Focus Ring


Et secundum collatio Focusing circulum et CVD sic focusing circulum:

Compare de Si fundatur focusing circulum et cvd sic focusing circulum
Item Et Cvd sic
Density (g / cm3) 2.33 3.21
Cohors Gap (Ev) 1.12 2.3
Thermal conductivity (W / cm ℃) 1.5 5
CTE (X10-6/ ℃) 2.6 4
Elastica modulus (GPA) 150 440
Durness (GPA) 11.4 24.5
Resistentia ad induendum et corrosio Pauper Praeclarus


Vetek semiconductor offert provectus solidum Silicon Carbide (CVD Silicon Carbide) partibus quasi sic focusing annulos ad semiconductor apparatu. Nostra solida Silicon carbide focusing annulos outperform traditional Silicon in terms of mechanica vires, eget resistentia, scelerisque conductivity, summus temperatus diuturnitatem, et Ion etching resistentia.


Key features nostri sic focusing annulos includit:

Maximum density ad reducitur etching rates.

Optimum Valerius cum summus bandgap.

High scelerisque conductivity et humilis coefficiens de scelerisque expansion.

Mechanica impulsum resistentia et elasticitas.

High duritia, gerunt resistentia, et corrosio resistentia.

Usura fabricaPlasma-amplificata eget vapor depositione (Pecvd)Techniques, nostri sic focusing annulos occursum augendae postulat etching processus in semiconductor vestibulum. Sunt disposito resistere altius plasma virtutis industria, specie inCapacitaliter coniungar Plasma (CCP)systems.

Vetek Semiconductor est Sic Porcek Annulorum providere eximia perficientur et reliability in semiconductor fabrica fabrica. Elige nostrum sic partes pro superior species et efficientiam.


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Cvd sic iactaret graphite imber caput

Cvd sic iactaret graphite imber caput

Et CVD sic tulerunt Graphite imber caput a Veteksemicon est summus perficientur component specie disposito semiconductor eget vapor depositione (cvd) processibus. Puritas artificialia a summo-puritate graphite et protected cum eget vapor depositione (CVD) Silicon Carbide (sic) coating, hoc imber caput delivers praestantiam diuturnitatem, scelerisque stabilitatem, et resistentia ad corrosivum gases. Vultus deinceps ad tuum porro consultationem.
Sic ora Orbis

Sic ora Orbis

Veteksemicon summus puritas sic ora circulos, specialiter disposito semiconductor etching apparatu, pluma outstanding corrosio resistentia et scelerisque stabilitatem, significantly enhancing lagunculis
Puritas CVD sic Rudis Material

Puritas CVD sic Rudis Material

Puritas CVD Sic Rudis Material paratus a CVD est optimus source materia ad Silicon carbide crystallum incrementum a corporalis vapor onerariam. CVD sic cvd sola crudi materiale in altum puritatis, quod est altior quam parvum particulas formatae per spontaneo de spontanea et C-continens vapores et non requirit dedicated rate. Potest crescere maxime princeps qualitas sic una crystallis. Exspecto inquisitionis.
Solidum sic wafer carrier

Solidum sic wafer carrier

Vetek Semiconductor solidum sicca sicca carrier est disposito ad altum temperatus et corrosio repugnant environments in semiconductor epitaxial processus et apta omnium genera laganum vestibulum processus cum excelsum pura requisita. Vetek Semiconductor est a ducens laganum carrier elit in Sina et vultus deinceps ad decore vestri diu term particeps in semiconductor industria.
Solidum sic discus informibus imber caput

Solidum sic discus informibus imber caput

Vetek Semiconductor est ducens Semiconductor apparatu Manufacturer in Sina et professional manufacturer et elit solidum sic disco informibus imber caput. Nostrum pervideo figura imber caput est late in tenuis film depositione productio ut CVD processus ut uniformis distribution of reaction Gas et unus ex Core components of CVD fornace.
SID SIB

SID SIB

Ut an provectus SIC sectore pars productum manufacturer et officinas in Sinis. Vetek Semiconducto SIC sectis pars est summus perficientur signa component late in semiconductor processus et alia extrema summus temperatus et alta pressura processibus. Receperint tua porro consultatio.

Veteksemicon solid silicon carbide is the ideal procurement material for high-temperature, high-strength, and corrosion-resistant components used in semiconductor and industrial applications. As a fully dense, monolithic ceramic, solid silicon carbide (SiC) offers unmatched mechanical rigidity, extreme thermal conductivity, and exceptional chemical durability in harsh processing environments. Veteksemicon’s solid SiC is specifically developed for critical structural applications such as SiC wafer carriers, cantilever paddles, susceptors, and showerheads in semiconductor equipment.


Manufactured through pressureless sintering or reaction bonding, our solid silicon carbide parts exhibit excellent wear resistance and thermal shock performance, even at temperatures above 1600°C. These properties make solid SiC the preferred material for CVD/PECVD systems, diffusion furnaces, and oxidation furnaces, where long-term thermal stability and purity are essential.


Veteksemicon also offers custom-machined SiC parts, enabling tight dimensional tolerances, high surface quality, and application-specific geometries. Additionally, solid SiC is non-reactive in both oxidizing and reducing atmospheres, enhancing its suitability for plasma, vacuum, and corrosive gas environments.


To explore our full range of solid silicon carbide components and discuss your project specifications, please visit the Veteksemicon product detail page or contact us for technical support and quotations.


Sicut professionalis {LXXVII} Manufacturer et elit in Sina, habemus nostram officinam. Utrum vos postulo customized servicia in occursum specifica necessitatibus vestris regione vel volunt emere provectus et durabile {LXXVII} in Sina, vos potest relinquere nos nuntium.
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