Vetek semiconductor solidum Silicon carbide est momenti tellus component in Plasma Etching Equipment, solidum Silicon Carbide (CVD Silicon Carbide) Partibus in Etching apparatu includitfocusing annulos, Gas showhead, Tray, Edge Annulorum, etc Ob ad humilis Reactivity et conductivity solidum Silicon Carbide (CVD Silicon Carbide) ad CHLORUM - et Plasma Plasma Etching Equipment Focusing Annulorum et aliarum components.
Exempli gratia, in focus anulus est momenti pars positus extra laganum et in directum contactus cum laganum, per applicando ad anulum ad focus in plasma transiens per anulum, ita focusing ad plasma in laganum ad amplio in dispensando. Traditional Focus anulus factum est de Silicon autquartz, PROLIXUS Silicon ut communis focus anulum materia, quod est fere prope ad conductivity Silicon Wafers, sed penuria est pauper etching resistentia in fluorine, continens Plasma, etching apparatus partibus, ut saepe usus est ad tempus, ibi erit gravis productionis.
Solid sic focus circulumOpus：
Et secundum collatio Focusing circulum et CVD sic focusing circulum:
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Compare de Si fundatur focusing circulum et cvd sic focusing circulum
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Item
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Et
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Cvd sic
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Density (g / cm3)
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2.33
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3.21
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Cohors Gap (Ev)
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1.12
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2.3
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Thermal conductivity (W / cm ℃)
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1.5
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5
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CTE (X10-6/ ℃)
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2.6
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4
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Elastica modulus (GPA)
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150
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440
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Durness (GPA)
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11.4
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24.5
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Resistentia ad induendum et corrosio
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Pauper
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Praeclarus
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Vetek semiconductor offert provectus solidum Silicon Carbide (CVD Silicon Carbide) partibus quasi sic focusing annulos ad semiconductor apparatu. Nostra solida Silicon carbide focusing annulos outperform traditional Silicon in terms of mechanica vires, eget resistentia, scelerisque conductivity, summus temperatus diuturnitatem, et Ion etching resistentia.
Key features nostri sic focusing annulos includit:
Maximum density ad reducitur etching rates.
Optimum Valerius cum summus bandgap.
High scelerisque conductivity et humilis coefficiens de scelerisque expansion.
Mechanica impulsum resistentia et elasticitas.
High duritia, gerunt resistentia, et corrosio resistentia.
Usura fabricaPlasma-amplificata eget vapor depositione (Pecvd)Techniques, nostri sic focusing annulos occursum augendae postulat etching processus in semiconductor vestibulum. Sunt disposito resistere altius plasma virtutis industria, specie inCapacitaliter coniungar Plasma (CCP)systems.
Vetek Semiconductor est Sic Porcek Annulorum providere eximia perficientur et reliability in semiconductor fabrica fabrica. Elige nostrum sic partes pro superior species et efficientiam.
