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Silicon Carbide Solidae

Vetek semiconductor solidum Silicon carbide est momenti tellus component in Plasma Etching Equipment, solidum Silicon Carbide (CVD Silicon Carbide) Partibus in Etching apparatu includitfocusing annulos, Gas showhead, Tray, Edge Annulorum, etc Ob ad humilis Reactivity et conductivity solidum Silicon Carbide (CVD Silicon Carbide) ad CHLORUM - et Plasma Plasma Etching Equipment Focusing Annulorum et aliarum components.


Exempli gratia, in focus anulus est momenti pars positus extra laganum et in directum contactus cum laganum, per applicando ad anulum ad focus in plasma transiens per anulum, ita focusing ad plasma in laganum ad amplio in dispensando. Traditional Focus anulus factum est de Silicon autquartz, PROLIXUS Silicon ut communis focus anulum materia, quod est fere prope ad conductivity Silicon Wafers, sed penuria est pauper etching resistentia in fluorine, continens Plasma, etching apparatus partibus, ut saepe usus est ad tempus, ibi erit gravis productionis.


Solid sic focus circulumOpus

Working Principle of Solid SiC Focus Ring


Et secundum collatio Focusing circulum et CVD sic focusing circulum:

Compare de Si fundatur focusing circulum et cvd sic focusing circulum
Item Et Cvd sic
Density (g / cm3) 2.33 3.21
Cohors Gap (Ev) 1.12 2.3
Thermal conductivity (W / cm ℃) 1.5 5
CTE (X10-6/ ℃) 2.6 4
Elastica modulus (GPA) 150 440
Durness (GPA) 11.4 24.5
Resistentia ad induendum et corrosio Pauper Praeclarus


Vetek semiconductor offert provectus solidum Silicon Carbide (CVD Silicon Carbide) partibus quasi sic focusing annulos ad semiconductor apparatu. Nostra solida Silicon carbide focusing annulos outperform traditional Silicon in terms of mechanica vires, eget resistentia, scelerisque conductivity, summus temperatus diuturnitatem, et Ion etching resistentia.


Key features nostri sic focusing annulos includit:

Maximum density ad reducitur etching rates.

Optimum Valerius cum summus bandgap.

High scelerisque conductivity et humilis coefficiens de scelerisque expansion.

Mechanica impulsum resistentia et elasticitas.

High duritia, gerunt resistentia, et corrosio resistentia.

Usura fabricaPlasma-amplificata eget vapor depositione (Pecvd)Techniques, nostri sic focusing annulos occursum augendae postulat etching processus in semiconductor vestibulum. Sunt disposito resistere altius plasma virtutis industria, specie inCapacitaliter coniungar Plasma (CCP)systems.

Vetek Semiconductor est Sic Porcek Annulorum providere eximia perficientur et reliability in semiconductor fabrica fabrica. Elige nostrum sic partes pro superior species et efficientiam.


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Silicon carbide imber caput

Silicon carbide imber caput

Silicon carbide imber caput habet optimum summus temperatus tolerantia, eget stabilitatem, scelerisque conductivity et bonum Gas distribution perficientur, quae potest consequi uniformis Gas distribution et amplio film qualis. Ideo solet usus est in altum temperatus processuum ut eget vapor depositione (CVD) vel physica vapor depositione (PVD) processibus. Receperint tuum Praeterea consultationem ad nos, Vetisk Semiconductor.
Silicon Carbide Sigillum Ring

Silicon Carbide Sigillum Ring

Ut a professional Silicon Carbide Sigillum Ring Product Manufactorer et Factory in Sina, Vetek Semiconductor Silicon Carbide Sigillum Ring est late in semiconductor processui apparatu ex eius optimum æstus resistentia, corrosio resistentia, mechanica et scelerisque conductivity. Est maxime idoneam pro processibus involving summus temperatus et reactivum vapores ut CVD, PVD et Plasma Etching et est a key materia choice in semiconductor vestibulum processus. Vestri porro inquiries sunt grata.
Cvd sic obstructionum pro sic crystallum incrementum

Cvd sic obstructionum pro sic crystallum incrementum

CVD sicci sicco sic crystallum incrementum, est novum excelsum puritatem rudis materia developed by Vetek Semiconductor. Is est a excelsum input-output ratio et potest crescere summus qualitas, magna-amplitudo Silicon carbide unum crystallis, quod est secunda-generation materiam ad reponere pulveris in foro hodie. Welcome to De Technical Exitus.
SIC crystallum incrementum novum technology

SIC crystallum incrementum novum technology

Vetek Semiconductor est ultra-princeps puritatis Silicon Carbide (microform) formatae a eget vapor depositione (CVD) est sodonicus utendum ut a source materiam ad crescente silicalis carbide crystallis per corporalis vapor (PVT). In sic crystallum incrementum novum technology, quod fons materia est oneratus in cruce et sublimate onto semen crystal. Uti excelsum puritatem CVD-sic cuneos esse sicut fons ad crescente sic crystallis. Welcome to statuam societate nobiscum.
Cvd sic imber caput

Cvd sic imber caput

Vetek semiconductor est a ducens cvd sic imber caput manufacturer et innovator in china.we sunt specialized in sic materia in multis years.cvd sic imber capite est electus in focusing anulus materiale ex eius optimum et resistentia ad plasma. Expectamus ad becoming vestri diu-term socium in Sinis.
SIC imber caput

SIC imber caput

Vetek semiconductor est a ducens sic imber caput manufacturer et innovator in china.we sunt specialized in sic materia pro multis anni.Sic imber caput est electus ut Plasma Socium in Sinis.

Veteksemicon solid silicon carbide is the ideal procurement material for high-temperature, high-strength, and corrosion-resistant components used in semiconductor and industrial applications. As a fully dense, monolithic ceramic, solid silicon carbide (SiC) offers unmatched mechanical rigidity, extreme thermal conductivity, and exceptional chemical durability in harsh processing environments. Veteksemicon’s solid SiC is specifically developed for critical structural applications such as SiC wafer carriers, cantilever paddles, susceptors, and showerheads in semiconductor equipment.


Manufactured through pressureless sintering or reaction bonding, our solid silicon carbide parts exhibit excellent wear resistance and thermal shock performance, even at temperatures above 1600°C. These properties make solid SiC the preferred material for CVD/PECVD systems, diffusion furnaces, and oxidation furnaces, where long-term thermal stability and purity are essential.


Veteksemicon also offers custom-machined SiC parts, enabling tight dimensional tolerances, high surface quality, and application-specific geometries. Additionally, solid SiC is non-reactive in both oxidizing and reducing atmospheres, enhancing its suitability for plasma, vacuum, and corrosive gas environments.


To explore our full range of solid silicon carbide components and discuss your project specifications, please visit the Veteksemicon product detail page or contact us for technical support and quotations.


Sicut professionalis {LXXVII} Manufacturer et elit in Sina, habemus nostram officinam. Utrum vos postulo customized servicia in occursum specifica necessitatibus vestris regione vel volunt emere provectus et durabile {LXXVII} in Sina, vos potest relinquere nos nuntium.
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