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Firmus Silicon Carbide

VeTek Semiconductor solidus Silicon Carbide magni ponderis est in plasma etching apparatu ceramico, carbide solidi pii (CVD pii carbide) Partes in apparatu includit etchingfocusing annulos, gas stillhead, lance, marginem annuli etc. Ob reactivitatem et conductivity solidi carbidi pii (CVD carbidi pii) ad vapores chlorinum - et fluorinum continentem etching vapores, est materia idealis pro plasma etching instrumento anulorum et aliorum. tium.


Verbi gratia, anulus focus est pars magna extra laganum posita et directa cum lagano, applicando anuli intentionem ad umbilicum plasma transeunte per anulum, ita ut plasma laganum ad meliorem uniformitatem ponat. expediendas. Anulus focus traditum e Pii or . e factus estvicus, proxumum silicon ut anulus communis materiae, prope ad conductivity siliconis lagani est, sed inopia est pauper etching resistentia in plasmate fluorino-continente, machinae partes materiae saepe adhibitae ad tempus, graves erunt. phaenomenon corrosio, graviter reducendo efficientiam suam efficiendi.


Solid SiC Focus RingPrincipium opus：

Working Principle of Solid SiC Focus Ring


Comparison of Si Based Ring Focusing and CVD SiC Focusing Ring

Comparison of Si Based Ring Focusing and CVD SiC Focusing Ring
Item And CVD SiC
Densitas (g/cm*3) 2.33 3.21
Cohors gap (eV) 1.12 2.3
Scelerisque conductivity (W/cm℃) 1.5 5
CTE (x10-6/℃) 2.6 4
Modulus elasticus (GPa) 150 440
Duritia (GPA) 11.4 24.5
Resistentia ad induendum et corrosio Pauper Praeclarus


VeTek Semiconductor offert carbidam silicon solidam (CVD carbidam pii) partes quasi SiC annulos pro instrumento semiconductoris positos. Pii carbide solidi nostri anulos positos outperformes silicones tradito in terminis vi mechanica, resistentia chemica, conductivity scelerisque, durabilitas summus temperatura, et resistentia Ion engraving.


Clavis notarum nostrarum SiC annulorum focusing includit:

Maximum densum ad reducta engraving rates.

Nulla magna cum bandgap.

Princeps scelerisque conductivity et humilis coefficiens expansionem scelerisque.

Superior impactio mechanica resistentia et elasticitas.

Alta duritia, resistentia, et corrosio resistentia.

Product perplasma depositionis vaporis chemica amplificatus (PECVD)technicis artibus, nostris SiC annulis positivis occurrentibus crebrescentibus postulationibus etingendi processuum in fabricandis semiconductoribus. Ordinantur ad altiorem plasmatis vim et industriam sustinere, specie incapacitively plasma copulatum (CCP)disciplinas.

VeTek Semiconductor's SiC anulos positos praebent eximiam observantiam et constantiam in fabrica fabricandis semiconductoris. Nostrum Sic partes pro superiori qualitate et efficacia elige.


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Cvd sic obstructionum pro sic crystallum incrementum

Cvd sic obstructionum pro sic crystallum incrementum

CVD sicci sicco sic crystallum incrementum, est novum excelsum puritatem rudis materia developed by Vetek Semiconductor. Is est a excelsum input-output ratio et potest crescere summus qualitas, magna-amplitudo Silicon carbide unum crystallis, quod est secunda-generation materiam ad reponere pulveris in foro hodie. Welcome to De Technical Exitus.
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SIC crystallum incrementum novum technology

SIC crystallum incrementum novum technology

Vetek Semiconductor est ultra-princeps puritatis Silicon Carbide (microform) formatae a eget vapor depositione (CVD) est sodonicus utendum ut a source materiam ad crescente silicalis carbide crystallis per corporalis vapor (PVT). In sic crystallum incrementum novum technology, quod fons materia est oneratus in cruce et sublimate onto semen crystal. Uti excelsum puritatem CVD-sic cuneos esse sicut fons ad crescente sic crystallis. Welcome to statuam societate nobiscum.
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Cvd sic imber caput

Cvd sic imber caput

Vetek semiconductor est a ducens cvd sic imber caput manufacturer et innovator in china.we sunt specialized in sic materia in multis years.cvd sic imber capite est electus in focusing anulus materiale ex eius optimum et resistentia ad plasma. Expectamus ad becoming vestri diu-term socium in Sinis.
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SIC imber caput

SIC imber caput

Vetek semiconductor est a ducens sic imber caput manufacturer et innovator in china.we sunt specialized in sic materia pro multis anni.Sic imber caput est electus ut Plasma Socium in Sinis.
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Gas Shower caput SiC solidum

Gas Shower caput SiC solidum

Solidum SiC Gas Shower Caput magnum munus agit in processu CVD uniformem reddendo, ita ut uniformis calefactio subiecti. VeTek Semiconductor in agro solidorum SiC machinarum per multos annos alte implicatus est et clientes dare potest cum nativus solidi SiC Gas Shower Capitula. Quaecumque autem necessaria sint, inquisitionem tuam expectamus.
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Chemical vapor depositionem processus solidum sic ora circulum

Chemical vapor depositionem processus solidum sic ora circulum

Vetek Semiconductor semper committitur ad investigationis et progressionem et vestibulum provectus semiconductor materiae. Hodie, Vetisk Semiconductor fecit magnum profectum in eget vapor depositione processus solidum sic ora anulum uber products et potest providere teloneariorum cum altus customized solidum sic acies annulos. Solidum sic ora annulos providere melius etching uniformitatem et precise wafer positioning cum usus est in electrostatic Chuck, ensuring consistent et reliable etching results. Vultus deinceps ad vestri inquisitionis et decet inter se diu-term sociis.
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Sicut professionalis {LXXVII} Manufacturer et elit in Sina, habemus nostram officinam. Utrum vos postulo customized servicia in occursum specifica necessitatibus vestris regione vel volunt emere provectus et durabile {LXXVII} in Sina, vos potest relinquere nos nuntium.
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