Aluminium Oxide LATERAMEN

I. Optimum insulating proprietatibus: 

Ceramic aluminum oxide have high resistivity and excellent insulating properties, can effectively isolate and protect semiconductor devices, prevent current leakage and interference in the circuit, to ensure the stability and reliability of the equipment.

II. Optimum altum temperatus resistentia: 

Aluminum Oxide Ceramic are able to work stably in high temperature environments, and can usually withstand temperatures of hundreds of degrees Celsius, which is very important for semiconductor equipment that requires long-time high-temperature operation of the components.

III. Bonum chemical stabilitatem: 

Ceramic Aluminium Oxide habet bonum eget inertia, acidum et alcali et alia oeconomiae habere altum resistentiam ad corrosio, quae facit in semiconductor vestibulum processus non facile est in chemically erosis, ad auxilium ponere diu terminus stabilitatem et servitium et inuenientem.

IV. Optimum mechanica proprietatibus: 

Non obstante esse Ceramic materia, Ceramic Aluminium Oxide etiam habet relative altum mechanica vires et duritiem, et possunt sustinere quaedam gradu corporis impulsum et accentus requirens summus praecisione et stabilitatem.

V. Bene processability et praecisione: 

Aluminium Oxide Ceramic potest esse fingitur, SINTERED et processionaliter in complexu figuris et precise magnitudinum de components cum excelsum superficiem metam, idoneam ad fabricantium de semiconductor apparatu in sarcina subiecta, in Siction

Et Applications of Veteksemicon Aluminium Oxide Ceramic Materials in Solaris et Semiconductor industries maxime includit:

I. Cava praesidio materiales

Aluminium oxide tellus habere optimum chemical stabilitatem, scelerisque stabilitatem, mechanica proprietatibus et electrica proprietatibus, quae facit aluminium oxide tellus et effective ut tutela materials ut defendat apparatu et ex eget et efficiens operationem in armorum.

II. PLASMA Equipment

Aluminum Oxide Ceramic have excellent high temperature resistance, chemical stability, electrical insulation and good mechanical properties, so they are widely used as structural materials and protective materials in plasma equipment to ensure stable and reliable operation of equipment in complex working environments.

III. Wafer Polishing Processus

Ceramic Aluminium Oxide est princeps duritiam et bonum scelerisque stabilitatem et electrica velit, ita sunt valde idoneam ut poliuntur discumbo materiae in laganum politiones processibus. Ceramic Aluminium cadmiae potest protegit lagana ex mechanica gerunt et eget exesa, ita improving accurate et stabilitatem politici.