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Pororus Sic Ceramic chucks
  • Pororus Sic Ceramic chucksPororus Sic Ceramic chucks

Pororus Sic Ceramic chucks

Et Pororem Sic Ceramic Paul by Veteksemicon est praecisione-machinator vacuo platform disposuerat secure et particula-libera lagestris pertractatio in Advlantander Semiconductor processus ut etching, Ion implantationem, CMP et inspectionem. Product ex summus puritas raro Silicon carbide, offert praestantes scelerisque conductivity, eget resistentia et mechanica vires. Cum customizable pore magnitudinum et dimensiones, Veteksemicon liberat tailored solutions ad occursum in occursum directorum postulat de Clekerroom lagunculi processus ambitus.

Et Pororem Sic Ceramic chucks offered by Veteksemicon est ex summus puritate raro siliconius carbide (microform), hoc tellus Chuck ensures uniformis gas fluunt, optimum et temperatus conditionibus. Est idealis pro vacuo clamping systems, ubi non-contactus, particula-libera laganum tractantem est discrimine.


Ⅰ. Key Material proprietatibus & perficientur beneficia


I. Optimum scelerisque conductivity & temperatus resistentia


Silicon carbide offert princeps scelerisque conductivity (120-200 w / m · k) et potest sustinere operating temperaturis supra MDC ° C, faciens ad Chuck processus ad Plasma etching depositione processus.

Partes: ensures uniformis calor dissipatio, reducendo laganum warpage et improving processus uniformitatem.


II. Superior mechanica & gerunt resistentia


In densa microstructure de sic dat in Chuck eximia duritia (> MM HV) et mechanica diuturnitatem, essentialis repetere laganum loading / unloading circuitus et dura processus ambitus.

Partes: Prosponat Chuck scriptor Lifespan cum maintaining dimensional stabilitatem et superficiem praecisione.


III. Imperium Porosity enim uniformis vacuum distribution


Et subtiliter Tuned porous structuram de Ceramic dat consistent vacuum suctionis per laganum superficiem, cursus secure lagesta collocatione cum minimal particula contaminationem.

Partes: Enhances Cleanroom compatibility et ensures damnum, liberum lagest processui.


IV. Optimum chemical resistentia


SIC inertness in mordax vapores et plasma environments protegit in Paul a degradation in reactive Ion etching vel eget elit.

Partes: Minimizes downtime et Purgato frequency, reducing operational sumptus.


Ⅱ. Veteksemicon s Aliquam & Support Services


At Veteksemicon, providere a plenum spectro de tailored officia in occursum ad exigit exigit semiconductor artifices:


● Custom Geometria & Pore Size Design: Nos offer chucks in variis magnitudinum, crassitudines et pore densitates nativus ad vestri apparatu cubits et vacuo requisita.

● ieiunium turnaround prototyping: Short plumbum et humilis MOQ productio Support pro R & D et gubernator lineas.

● Reliable post-Sales ServiceEx installation ductu ad Lifecycle magna, ut diu term perficientur stabilitatem et technica firmamentum.


Ⅲ. Applications


● Etching et Plasma Processing Equipment

● Ion implantatio et annealing gazophylacia

● chemical mechanica Polishing (CMP) Systems

● Metrology et inspectionem platforms

● Vacuum tenens et clamping systems in tulkroom environments

VenekeMeIcIcIcIction Shop:

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Hot Tags: Vacuum Clamps Plate, Veteksemicon SIC products, laganum pertractatio system, sic Paul pro Etching
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