Pororem Sic

Pororem Sic


Vetek Semiconductor est ducens manufacturer de Porous sic Ceramics ad semiconductor industria. Transierunt ISO9001, Vetek Semiconductor habet bonum imperium in qualis. Vetec Semiconductor semper committitur ad decet in innovator et ducem in raro sic Ceramic industria.


Porous SiC Ceramic Disc

Pororem Sic Ceramic Disc


Pororus Sic Ceramics sunt Ceramic materia, quae sunt accensus ad altum temperaturis et habere magnum numerum internonectected aut clausa poros intus. Est etiam notum est ut microporous vacuum suctionem calicem, cum pore moles vndique a II ad 100um.


Pororem Sic Ceramics late in metallurgy, eget industria, environmental tutela, biology, semiconductor et aliis agris. Purore Sic Ceramics potest parari per spumans modum, Sol gel modum, tape mittens modum, solidum peccare modum et impregnation Pyrolysis modum.


Preparation of porous SiC ceramics by sintering method

Praeparatio Puvent SIC Ceramics per Sinctering modunus

Compressive strength of Porous SiC ceramicsFlexural strength of Porous SiC ceramicsFracture toughness of Porous SiC ceramicsthermal conductivity ofPorous SiC ceramics

Proprietatibus raro Silicon carbide LATERAMEN paravit per diversas modos in function of poros



porous SiC ceramics Suction Cups in Semiconductor Wafer Fabrication

Purore Sic Ceramics Suction pocula in Semiconductor laganace


Vetek Semiconductor est Poruus Sic Ceramics Play in Partes in Clamping et portantes wafers in semiconductor productio. Sunt densa et uniformis, princeps in viribus, bonum in aere permeability et uniformis in adsorption.


Et efficaciter address tot difficile problems ut laganum incisum et chip electrostatic naufragii et auxilium consequi processus maxime summus qualitas wafers.

Working Diagram de Puvens Sic Ceramics:

Working diagram of porous SiC ceramics


Opus principium de raro Sic Ceramics: et Silicon Wafer sit certa a vacuo adsorption principle. Per dispensando, in parva foramina in raro sic Ceramics sunt ad eliciunt caeli inter Silicon laga et Ceramic superficiem, ut Silicon lana et Ceramic superficiem sunt ad humilis pressura, ita fixing Silicon laga.


Post dispensando, plasma aquam fluit ex foraminibus ne Silicon laganum a adhaerens ad Ceramic superficiem simul et Silicon laga et Ceramic superficiem purgari.


Microstructure of the porous SiC ceramics

Microstucture de raro sic Ceramics


Highlight commoda et features:


● High Temperature Resistance

● resistentia ad induendunus

● chemical resistentia

● High mechanica vires

● Securus ad regenerare

● optimum scelerisque inpulsa resistentia


item
unitas
Pororus Sic Ceramics
PORE
unus
X ~ XXX
Densitas
G / CM3
1.2 ~ 1.3
Superficiem rougcalumnia
unus
2.5 ~ III
Aeris effusio valorem
Kpa
-45
Flacalis fortitudinem
MPA
30
Dielectric constant
1MHz
33
Scelerisque conductivity
W / (m k)
LX ~ LXX

Plures alta requisita raro Sic Ceramics:


I. fortis vacuo adsorption

II. Plances est valde magna, aliter non erit problems per operationem

III. Non deformatio et non metallum impudicitiis


Ideo in aerem effusio valorem de Veteec Semiconductor scriptor Porobus Sic Ceramics ad -45kpa. Simul sunt temperari MCC ℃ 1.5 horas antequam officinas removere impudicitiis et packaged in vacuo sacculos.


Pororem Sic Ceramics late in lagoenas in lagoenas processus technology, transferre et alia links. Et fecerunt magnas res gestae in vinculum, Dorming, adscendens, politant et alia links.


View as  
 
Porous SiC Vacuum Chuck

Porous SiC Vacuum Chuck

Vetek Semiconductoris Porous SiC Vacuum Chuck plerumque in instrumentis fabricandis semiconductoris elementis clavis adhiberi solet, praesertim cum ad processus CVD et PECVD venit. Vetek Semiconductor specialist in fabricandis et praestandis summus perficientur Porous SiC Vacuum Chuck. Grata pro ulterioribus percunctationibus tuis.
Porous Ceramic Vacuum Chuck

Porous Ceramic Vacuum Chuck

Vetek Semiconductoris Porous Ceramici Vacuum Chuck factus est ex materia carbide pii ceramici (SiC) quae optimam resistentiam caliditatis habet, stabilitatem chemicam et vires mechanicas. Core nucleus necessarius est in processu semiconductori componente. Excipe amplius percontationes tuas.
Pororus Sic Ceramic Paul

Pororus Sic Ceramic Paul

Vetek Semiconductor offert puva Sic Ceramic Chuck late usus est in Wafer Processus Technology, translatione et alia links, idoneam ad vinculum, errare, laser. Porore sic Ceramic Chuck nostra plus-fortis vacuo adsorption, princeps planities et excelsum castitatem dignum occurrit necessitatibus maxime semiconductor industries.welcome inquisitionis nobis.

Order precision-engineered Porous SiC ceramics from Veteksemicon—ideal for thermal uniformity and gas control in semiconductor systems.


Veteksemicon’s porous silicon carbide (SiC) components are engineered for high-temperature plasma processes and advanced gas flow control. Ideal for PECVD, ALD, vacuum chucks, and gas distribution plates (showerheads), these components offer excellent thermal conductivity, thermal shock resistance, and chemical stability.


Our porous SiC features a controlled pore structure for consistent gas permeability and uniform temperature distribution, reducing defect rates and enhancing yield. It is widely used in wafer handling platforms, temperature equalizing plates, and vacuum holding systems. The material ensures mechanical durability under corrosive and high-load thermal conditions.


Contact Veteksemicon today to request custom Porous SiC solutions or detailed engineering parameters.


Sicut professionalis {LXXVII} Manufacturer et elit in Sina, habemus nostram officinam. Utrum vos postulo customized servicia in occursum specifica necessitatibus vestris regione vel volunt emere provectus et durabile {LXXVII} in Sina, vos potest relinquere nos nuntium.
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept