Products
Cvd sic iactaret graphite imber caput
  • Cvd sic iactaret graphite imber caputCvd sic iactaret graphite imber caput

Cvd sic iactaret graphite imber caput

Et CVD sic tulerunt Graphite imber caput a Veteksemicon est summus perficientur component specie disposito semiconductor eget vapor depositione (cvd) processibus. Puritas artificialia a summo-puritate graphite et protected cum eget vapor depositione (CVD) Silicon Carbide (sic) coating, hoc imber caput delivers praestantiam diuturnitatem, scelerisque stabilitatem, et resistentia ad corrosivum gases. Vultus deinceps ad tuum porro consultationem.

Veteksemicon cvd sic iactaret graphite imber caput, eius praecisione-machinatorie superficiem ensheres uniformis Gas distribution, quae est discrimine ad consequi consistent film depositione per incantationem. InSic coatingNon solum enhances gerunt resistentia et oxidatio resistentia, sed etiam se extendit servitium vitae sub dura processus conditionibus.


Late applicantur in Semiconductor lagae Fabricacation, epitaxy, et tenuis-film depositione, in cvd sic iactaret graphite imber caput est idealis arbitrium pro manufacturers quaerimus, quod est specimen arbitrium pro manufacturers quaerimus, quod obviam in postulat ex altera-generationem semiconductor est.


Veteksemi CVD Silicon carbide showerhead est fabricari a summus puritas eget vapor deposita Silicon carbide et optimized ad CVD et Mucvd processibus in semiconductor, ducitur, et provectus electronics industries. Et egregius scelerisque stabilitatem, corrosio resistentia, et uniformis Gas distribution ut diu term stabilis operatio in altus-temperatus, altus corrosive et cedat.


Veteksemicon cvd sic iactaret graphite imber caput Core commoda


Ultra-summus puritas et density

Et cvd sic metus iactaret graphite imber caput est fabricari per altus-puritate CVD processus, ensuring a materia puritatis ≥99.9995%, eliminating ulla metallicis impudicitiis. Et non-raro structuram efficaciter prohibet Gas permeation et particulam effusione, faciens idealis pro semiconductor epitaxy et provectus packaging processus requiring maxime princeps mundities. Comparari Traditional Sinaed SIC vel Graphite Components, nostrum uber maintains firmum perficientur etiam post longum differentur altus-temperatus operatio, reducing sustentationem frequency et productio costs.


Optimum scelerisque stabilitatem

In summus temperatus cvd et Mucvd processibus, conventional materiae sunt susceptibilis ad deformationem vel crepuit ex scelerisque accentus. Et CVD sic showerhead ResTands temperaturis usque ad MDC ° C et features est maxime humilis coefficiens scelerisque expansion, ensuring structuram stabilitatem durante celeri temperatus crescit et decrescit. Et uniformis scelerisque conductivity porro optimizes temperatus distribution intra reactionem thalamum, minimizing depositione rate differences inter laganum et media et centrum et improving film uniformitatem.


Anti-Plasma corrosio

Per Etching vel depositionem processibus, altus mordax vapores (ut CF4, Cl2Et HBR) cursim proponit conventional quartz aut graphite components. In cvd sic materia exhibet exhibet eximia corrosio resistentia in plasma environments, cum lifespan 3-5 temporibus, quod conventional materiae. Customer probatio ostensum est quod etiam post MM horas continua operatio, pie magnitudine variation manet intra ± I%, ensuring longa-term stabilis Gas influunt distribution.


Longum et humilis sustentacionem pretium

Dum Traditional Graphite Components eget crebris replacement, CVD imber caput cum sic iactaret occupat firmum perficientur etiam in dura environments. Hoc reduces altiore costs per super XL%. Praeterea, in materia scriptor alta mechanica vires prohibet accidentale damnum per pertractatio vel installation.


CHRINGULATIONEM CONTENDO verificationis Endorsement

Veteksemicon CVD Silicon Carbide Showerhead' ecological chain verification covers raw materials to production, has passed international standard certification, and has a number of patented technologies to ensure its reliability and sustainability in the semiconductor and new energy fields.


Technical parametri

Project
Parameter
Materia
Cvd sic (coating options praesto)
Diameter range
100mm-450mm (Fusce)
Crassitudine tolerantia
± 0.05mm
AGRESSUS
≤0.2μm
PROGRESSUS
CVD / Mucvd / Pecvd / Etching / EPITAXY


Pelagus applicationem agri

Applicationem directionem
Typical sem
Semiconductor vestibulum
Silicon Epitaxy, Gan / Gaas cogitationes
Potentia electronics
SIC epitaxial laganum productio
DUXERIT
Mucvd Sapphire substratu deposition
Scientific Research apparatu
Summus praecisione tenuis film deposition ratio


CHRINGULATIONEM CONTENDO verificationis Endorsement

Veteksemicon CVD Silicon Carbide Showerhead' ecological chain verification covers raw materials to production, has passed international standard certification, and has a number of patented technologies to ensure its reliability and sustainability in the semiconductor and new energy fields.


Nam detailed technica cubits, albus papers, aut sample probationis dispositiones placereContact nostri Technical Support dolorUt explorarent quam Vetecsemicon potest augendae processus efficientiam.


Veteksemicon Warehouse


Hot Tags: Cvd sic iactaret graphite imber caput
Mitte Inquisitionem
Contactus info
Percontationes de Silicon Carbide Coating, Tantalum Carbide Coating, Graphite speciale vel indicem pretiosum, electronicam tuam nobis relinque et intra 24 horas erimus.
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept