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Oxidatio et diffusa fornacem

Oxidatio et diffusa Furnorum in variis agris ut semiconductor cogitationes, discreta cogitationes, optoelectronic cogitationes, potentia electronic cogitationes solis cellulis et magnis, integrated circuitu vestibulum. Sunt usi sunt pro processus inter diffusio, oxidatio, annealing, offering, et morticando lagana.


Vetek semiconductor est ducens manufacturer specialiter in productionem summus puritatis graphite, silicon carbide et quartz components in oxidatio et diffusio fornaces. Nos committitur providente summus qualitas fornace components pro semiconductor et photovoltaic industries, et in forefront of superficiem coating technology, ut CVD-sic, cvd-Tac, ut CVD-sic, cvd-Tac, ut CVD, etc.


Et commoda Vetec Semiconductor Silicon Carbide components:

● High Temperature resistentia (usque ad MDC ℃)

● optimum scelerisque conductivity et thermal stabilitatem

● bonum chemical corrosio resistentia

● humilis coefficiens scelerisque expansion

● princeps virtutis et duritia

● Long Service Vita


In oxidatio et diffusa Furnorum, ex praesentia altum temperatus et mordax vapores, multis components eget usum summus temperatus et corrosio, repugnant materiae, in quibus Silicon carbide (microform) est communiter electron. Et haec sunt commune Silicon Carbide components in oxidatio Furnorum et Diffusum Furnorum:



● Wafer navem

Silicon carbide laganum navi est continens usus ad portare Silicon lana, quae potest sustinere altum temperaturis et non agere cum Silicon wafers.


● fornacis tubo

Core in fornacem tubus est Core component de Diffusu fornacem, ad accommodare Silicon lana et control reactionem amet. Silicon carbide fornacem tubi habere optimum summus temperatus et corrosio resistentia perficientur.


● Baffle laminam

Ad moderari airflow et temperatus distribution intra fornacem


● Thermocouple praesidium tubi

Ad protegere temperatus mensuræ thermocouples ex recta contactus cum mordax vapores.


● cantilever paxillum

Silicon carbide cantilever paddles repugnant ad altum temperatus et corrosio et sunt ad onerariis Silicon naves vel quartz navibus portantes siliconica wafers in diffusionem fornacem tubulis.


● Gas injector

Ad introducendam reactionem Gas in fornacem, quod indiget repugnant ad altum temperatus et corrosio.


● navem carrier

Silicon Carbide Wafer navem carrier adhibetur figere et subsidium Silicon lana, quae ut commoda ut altus vires, corrosio resistentia et bonum structuram stabilitatem.


● fornacem ostium

Silicon carbide coatings vel components potest etiam esse in medio de fornace ostium.


● calefactio elementum

Silicon carbide calefacit elementa apta temperaturis, princeps virtutis et cito temperaturis ad M ℃.


● Sic liner

Ad protegendum interiorem murum fornacis tubulis, potest auxilium reducere damnum calor industria et sustinere dura ambitus ut altum temperatus et princeps pressura.

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Sic lagae navem

Sic lagae navem

Et sicco lacus navi adhibetur ad portare laganum, maxime ad oxidatio et diffusio processus, ut temperatus potest esse aequaliter distribui in laganum superficiem. Et summus temperatus stabilitatem et excelsum scelerisque conductivity of sic materiae ut efficiens et reliable semiconductor processus. Vetek Semiconductor committitur ad providing qualis products ad competitive prices.
Sic Processus Tube

Sic Processus Tube

VeTek Semiconductor summus perficientur praebet SiC Processus Tubuli semiconductor fabricandi. Nostri processus Tubuli SiC in oxidatione, diffusione processuum praestant. Cum qualitate et artificio superiore, hae fistulae summus temperaturae stabilitatem et conductionem scelerisque pro processus semiconductoris efficientis offerunt. Certatim Morbi cursus sapien offerimus et quaerite ut particeps sit vestri longi temporis in Sinis.
Sic cantilever paxillum

Sic cantilever paxillum

Vetek Semiconductor est Sic cantilever paxillum est usus in calor curatio furnaces ad tractantem et supporting lagam naves. Et summus temperatus stabilitatem et excelsum scelerisque conductivity of sic materia ut princeps efficientiam et reliability in semiconductor processus processus. Nos committitur ad providing summus qualis products ad competitive prices et expectamus ad decet diu-term socium in Sinis.
Silicon Carbide Wafer cymba ad fornacem Horizontalem

Silicon Carbide Wafer cymba ad fornacem Horizontalem

Scapha SiC laganum altam postulationem in puritate materiali habet. Vetek Semiconductor suppleat puritatem SiC >99.96% recrystallized SiC huic producto.VeTek Semiconductor est fabrica professionalis et supplementum in Sinis pro carbide lagani pii in fornace horizontali, annis experientiae in R&D et productio, quale bene potest moderari et pretium auctori offerre. Certo certius potes emere naviculam lagani carbidam Pii ad fornacem horizontalem a nobis.
SiC Coated Silicon Carbide Wafer cymba

SiC Coated Silicon Carbide Wafer cymba

SIC CARBIDE CARBIDE CARBIDE CARBIDE CARBIBUS navi est disposito cum CLXV foramina ad portare Wafers.Vetek Semiconductor est professional manufacturer et elit in Sina in SIC CARBIDE CARBIDE CALBIDE CALBIDE SINGULTUM in SIC SILION CARBIDE CALABIDE in Sina pro SIC Silicon Carbide Wafer in Sinis, cum annos experientia in R & D et productionem, cum annos experientia in R & D et productionem, potest control in R & D et productio, cum annos experientia in R & D Production, cum annos experientia in R & D Production, cum annos et in competitive pretium. Receperint enim visitare nostri Factory et adhuc disputationem in cooperante.
Silicon carbide cantilever paxillum

Silicon carbide cantilever paxillum

Vetek Semiconductor est Silicon carbide cantilever paddle est momenti pars in semiconductor vestibulum processus, praesertim idoneam ad diffusionem Furnorum vel LPCVD Furnaces in altum temperatus processuum ut diffusa et RTP temperatus. Noster Silicon Carbide cantilever paxillum est diligenter disposito et artificialia cum optimum summus temperatus resistentia et mechanica vires, et tuto ac fidelibus onerariis ad processum fistulam in dura processus condiciones ad varios summus temperatus processus ut diffusio et RTP. Expectamus ad becoming vestri diu-term socium in china.feel liberum ad inquire nobis.

Shop high-performance Oxidation and Diffusion Furnace components at Veteksemicon—your trusted source for SiC-based thermal process solutions.


Veteksemicon supplies premium-grade silicon carbide (SiC) components designed specifically for oxidation and diffusion furnace systems in semiconductor manufacturing. These SiC parts exhibit excellent thermal shock resistance, high mechanical strength, and long-term dimensional stability in ultra-high-temperature and oxidizing environments. Ideal for process temperatures exceeding 1200°C, they are widely used in atmospheric and low-pressure diffusion systems, oxidation furnaces, and vertical thermal reactors.


Our product portfolio includes SiC cantilevers, boats, support rods, and tube liners, all engineered for precise wafer positioning and minimal particle contamination. The low thermal expansion coefficient of SiC helps maintain alignment across thermal cycles, while its chemical inertness ensures compatibility with O₂, N₂, H₂, and dopant gases. Whether for dry oxidation or dopant diffusion (e.g., phosphorus or boron), Veteksemicon’s diffusion furnace solutions enhance process stability, extend maintenance intervals, and support 200mm/300mm wafer formats.


For technical drawings, material datasheets, or quotation support, please visit Veteksemicon’s Oxidation and Diffusion Furnace product page or contact our application engineers.


Sicut professionalis {LXXVII} Manufacturer et elit in Sina, habemus nostram officinam. Utrum vos postulo customized servicia in occursum specifica necessitatibus vestris regione vel volunt emere provectus et durabile {LXXVII} in Sina, vos potest relinquere nos nuntium.
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