Products

Pii Carbide Ceramics

VeTek Semiconductor est particeps tua porttitor in agro processus semiconductoris. Cum nostro amplo portfolio semiconductoris gradus Silicon Carbide Ceramics materiales iuncturas, componentes facultates fabricandi, et operas machinales applicans, adiuvare possumus provocationes significantes superare. Instrumentum technicum Silicon Carbide Ceramics late applicatur in industria semiconductoris ob eximiam materialem observantiam. VeTek Semiconductoris ultra-puri Siliconis Carbide Ceramici frequentantur per totum cyclum semiconductoris fabricandi et processus.


DIFFUSION & LPCVD PROCESSING

VeTek Semiconductor ceramicos machinatos praebet componentes batch diffusionis et LPCVD requisita in specie designata;

• Baffles & singu
• Injectors
• Liners & processus fistulae
• Pii Carbide Paddles Cantilever
• laganum navigia et bases


PROCESSU SCELERO COMPONENTS

Contaminationem obscuram et indisciplinatam conservationem cum summus puritatis tium machinatorum propter duritias plasmatis etch processui, inter quas:

Focus annulos

Nozzles

clypei

Showerheads

Fenestra / Lids

Alia consuetudo components


PRAECEPS processui sceleste & EPITAXIAL PROCESSU COMPONENTS

VeTek Semiconductor praebet materias progressus componentes ad formandam summus temperaturas applicationes processus scelerisque in semiconductoris industriae. Hae applicationes circumdant RTP, Epi processuum, diffusionem, oxidationem, furnum. Nostrae technicae ceramicae destinatae sunt ut acervos thermas sustineant, certa et constanti effectui tradendo. Cum VeTek Semiconductoris partes, semiconductoris artifices processus efficiens et summus qualitas scelerisque consequi possunt, ad altiore successu productionis semiconductoris conferentes.

• Difusores

• Insulators

• Susceptores

• Alia consuetudo scelerisque components


Corporalia proprietates Pii Carbide Recrystallized
Property Typical Value
Opus temperatus (°C) 1600°C (cum oxygenio) 1700°C (reducing environment)
Sic / SiC content > 99.96%
Si / Free Si content < 0.1%
mole densitatis 2.60-2.70 g/cm3
Apparens poros < 16%
Cogo vires > DC MPa
Frigus inflexio virium 80-90 MPa (20°C)
Calidum inflexio virium 90-100 MPa (1400°C)
Scelerisque expansion @ MD°C 4.70 10-6/°C
Scelerisque conductivity @1200°C 23  W/m•K
Modulus elasticus 240 GPa
Scelerisque inpulsa resistentia perquam bonum


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Sic lagae navem

Sic lagae navem

Et sicco lacus navi adhibetur ad portare laganum, maxime ad oxidatio et diffusio processus, ut temperatus potest esse aequaliter distribui in laganum superficiem. Et summus temperatus stabilitatem et excelsum scelerisque conductivity of sic materiae ut efficiens et reliable semiconductor processus. Vetek Semiconductor committitur ad providing qualis products ad competitive prices.
Sic Processus Tube

Sic Processus Tube

VeTek Semiconductor summus perficientur praebet SiC Processus Tubuli semiconductor fabricandi. Nostri processus Tubuli SiC in oxidatione, diffusione processuum praestant. Cum qualitate et artificio superiore, hae fistulae summus temperaturae stabilitatem et conductionem scelerisque pro processus semiconductoris efficientis offerunt. Certatim Morbi cursus sapien offerimus et quaerite ut particeps sit vestri longi temporis in Sinis.
Sic cantilever paxillum

Sic cantilever paxillum

Vetek Semiconductor est Sic cantilever paxillum est usus in calor curatio furnaces ad tractantem et supporting lagam naves. Et summus temperatus stabilitatem et excelsum scelerisque conductivity of sic materia ut princeps efficientiam et reliability in semiconductor processus processus. Nos committitur ad providing summus qualis products ad competitive prices et expectamus ad decet diu-term socium in Sinis.
Silicon Carbide Wafer cymba ad fornacem Horizontalem

Silicon Carbide Wafer cymba ad fornacem Horizontalem

Scapha SiC laganum altam postulationem in puritate materiali habet. Vetek Semiconductor suppleat puritatem SiC >99.96% recrystallized SiC huic producto.VeTek Semiconductor est fabrica professionalis et supplementum in Sinis pro carbide lagani pii in fornace horizontali, annis experientiae in R&D et productio, quale bene potest moderari et pretium auctori offerre. Certo certius potes emere naviculam lagani carbidam Pii ad fornacem horizontalem a nobis.
SiC Coated Silicon Carbide Wafer cymba

SiC Coated Silicon Carbide Wafer cymba

SIC CARBIDE CARBIDE CARBIDE CARBIDE CARBIBUS navi est disposito cum CLXV foramina ad portare Wafers.Vetek Semiconductor est professional manufacturer et elit in Sina in SIC CARBIDE CARBIDE CALBIDE CALBIDE SINGULTUM in SIC SILION CARBIDE CALABIDE in Sina pro SIC Silicon Carbide Wafer in Sinis, cum annos experientia in R & D et productionem, cum annos experientia in R & D et productionem, potest control in R & D et productio, cum annos experientia in R & D Production, cum annos experientia in R & D Production, cum annos et in competitive pretium. Receperint enim visitare nostri Factory et adhuc disputationem in cooperante.
Silicon carbide cantilever paxillum

Silicon carbide cantilever paxillum

Vetek Semiconductor est Silicon carbide cantilever paddle est momenti pars in semiconductor vestibulum processus, praesertim idoneam ad diffusionem Furnorum vel LPCVD Furnaces in altum temperatus processuum ut diffusa et RTP temperatus. Noster Silicon Carbide cantilever paxillum est diligenter disposito et artificialia cum optimum summus temperatus resistentia et mechanica vires, et tuto ac fidelibus onerariis ad processum fistulam in dura processus condiciones ad varios summus temperatus processus ut diffusio et RTP. Expectamus ad becoming vestri diu-term socium in china.feel liberum ad inquire nobis.
Sicut professionalis {LXXVII} Manufacturer et elit in Sina, habemus nostram officinam. Utrum vos postulo customized servicia in occursum specifica necessitatibus vestris regione vel volunt emere provectus et durabile {LXXVII} in Sina, vos potest relinquere nos nuntium.
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