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LPE SI EPI Susceptor Set
  • LPE SI EPI Susceptor SetLPE SI EPI Susceptor Set

LPE SI EPI Susceptor Set

Plana susceptator et hydriam suspendor sunt pelagus figura epi susceptors.vetek semiconductor est a ducens lpe si epi susceptator set manufacturer et innovator in China.we in tantum in sicco lpes et epi susceptator Set disposito specie LPP Pe2061s IV "wafers. Et matching gradum de graphite materia et sic non coating est bonum, quod uniformitas est optimum, et vita longa, quod potest amplio cede epitaxy, quod potest amplio in LIQUENTUM EPITAAXY) Process.We Welcome vobis visitare nostri Factory in Sinis.

Et semiconductor is a professional China LPE Si EPI Susceptor Set manufacturer and supplier. Cum bona qualitate et pretio auctoris, officinam nostram visitare suscepimus, et nobiscum cooperationem diuturnum constituimus.


Et Vetisech Semiconductor LPP Si Epi susceptator set est summus perficientur productum creata per applicando a fine layer de Silicon carbide onto superficies altus purificatusIsotropic Graphite. Hoc effectum per Vetec Semiconductor est proprietary chemical vapor depositione (CVD) processus.


Et semiconductoris LPE Si Epi Susceptor Pone CVD depositio epitaxialis dolii reactor designatus est ad fideliter faciendum etiam in condicionibus provocandis. Praeclara eius adhaesio coatingis, resistentia ad oxidationis summus temperatus, et corrosio optimam electionem efficit pro asperis ambitibus. Praeterea, eius profile uniformis scelerisque ac laminae gasi fluunt exemplaris contagione impediunt, incrementum praecipuorum qualitatum epitaxialium stratis procurant.


Et dolium, informibus consilio nostri semiconductor epitaxial reactor optimizes fluxus Gas, ensuring quod æstus est aequaliter distribuit. Hoc pluma efficaciter prohibet contaminationem et diffusio impudicitiis, tutor productio summus qualitas epitaxial layers super laganum subiecta.


In VeTek Semiconductor commendati sumus ut emptores compararent cum productis summus qualitas et sumptus efficens. Noster LPE Si Epi Susceptor Set offert competitive Morbi cursus sapien, servato optimae densitatis pro utroque graphite et subiectoPii carbide coating. Hoc iunctura ensures reliable praesidium in altus-temperatus et mordax working environments.


SEM DATA CVD SIC FILM

SEM DATA OF CVD SIC FILM


Basicae physicae proprietates CVD SiC efficiens:

Basicae physicae proprietates CVD SiC coating
Res Typical valorem
Crystal Structure FCC β Phase polycrystallina, maxime (111) ordinatur
CVD sic coating density 3,21 G / CM³
Sic coating duritia MMD Vickers duritiem 500g onus
Frumea magnitudine II ~ 10mm
Chemical castitas 99,99995%
Calor Capacity DCXL J · k-1· K-1
Sublimation Temperatus MMDCC ℃
Flacalis fortitudinem CDXV MPA Rt IV-Point
Young 's modulus CDXXX GPA 4pt flectere, MCCC ℃
Scelerisque conductivity 300W·m-1· K-1
Scelerisque Expansion (CTE) 4.5×10-6K-1


Et semiconductor LPE SI EPI Susceptor SetProductio Shop

SiC Graphite substrateLPE SI EPI Susceptor Set testSilicon carbide ceramic processingEPI process equipment

Overview of the semiconductor chip epitaxy industry catena:

Overview of the semiconductor chip epitaxy industry chain


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