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Sic coating collector deorsum
  • Sic coating collector deorsumSic coating collector deorsum
  • Sic coating collector deorsumSic coating collector deorsum

Sic coating collector deorsum

Cum nostri peritia in CVD sic coating vestibulum, Vetek semiconductor superbe praesentium aixtron sic coating collector imo, centrum et summo. Haec sic coating collector imo constructum per altum puritatem graphite et coated cum CVD sic, ensuring immunditia infra 5ppm. Sentire liberum ad pervenire ad nos pro ulterior notitia et inquisitiones.
Mitte Inquisitionem 
depictio producti

Vetek semiconductor est manufacturer scelus providing princeps qualitasCVD Tac coatingEt CVD sic coating collector imo et operatur arctius Axtron apparatu obviam necessitatibus nostris customers. Utrum in processus optimization vel novi productum progressionem, ut parati sumus ad providere vobis cum technica firmamentum et respondere quis quaestiones ut habeatis.

Product Core Function

Domicilii stabilitatem spondet

Temperatus gradiente imperium: ±1.5℃/cm@1200℃


Fluunt Field Optimization: specialem channel consilio facit reactionem Gas distribution uniformitatem usque ad 92.6%


Equipment praesidium mechanism

Dual Donec:


Thermal Missa Buffer: X ℃ / s celeri temperatus mutatio


Particula interception, captanda> 0.3μm ibidae particulae


In agro secans-ore technology

Directio applicationem
 Propria processus parametri
 Customer pretii
Gradu igbt
 X ^ XVII / CM³ doping uniformitatem  Cede auctus per 8-12%
5G RF Fabrica
 Superficiem asperitas <0.15nm
 Carrier mobilitatem auctus per XV%
PV HJT Equipment  Anti-pid senescit test> MMM CYCLES
 Apparatu sustentacionem cycle extenditur (IX) horis

Omnis processus qualitas imperium

Productio Traceability System

Fontem rudis materiae: Tokai / Toyo Graphite ex Iaponia, SGL Graphite Germaniae

Digital Didymus Cras: Quisque pars est matched ad independens processus modularis database


Applicationem sem;

Tertia generatione semiconductor vestibulum

Sem, VI-inch sic epitaxial incrementum (100-150μm crassitudine control)

Compatible Model: Aixtron G5 WW / CRIUS II




Per usura aixtron sic linuit collector Top, COACTOR centrum et sic iactaret collector, scelerisque procuratio et eget praesidium in semiconductor opercitarturing processus potest esse amplio et consistency amet potest esse melior. In compositum ex his components in Aixtron apparatu ensures firmum processus conditionibus et agentibus semiconductor productio.




SEM data de CVD sic film

SEM DATA OF CVD SIC FILM


Basic physica proprietatibus CVD sic coating:

Basic physica proprietatibus CVD sic coating
Res Typical valorem
Crystal structure FCC β tempus Polycrystalline, maxime (CXI) Oriented
Densitas 3,21 G / CM³
Durities MMD Vickers Duritia (500g Load)
Frumea magnitudine II ~ 10mm
Chemical castitas 99,99995%
Calor DCXL J · k-1· K-1
Sublimation Temperatus MMDCC ℃
Flacalis fortitudinem CDXV MPA Rt IV-Point
Young 's modulus CDXXX GPA 4pt flectere, MCCC ℃
Scelerisque conductivity 300W · M-1· K-1
Thermal Expansion (CTE) 4.5 × X-6K-1


Overview de semiconductor Chip epitaxy Industry catenae

SiC Epitaxy Si Epitaxy GaN Epitaxy


Et semiconductorSic coating collector deorsumTabernam productio

SiC Coated Wafer CarrierAixtron Collector equipmentCVD SiC Focus RingSemiconductor process Equipment



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Percontationes de Silicon Carbide Coating, Tantalum Carbide Coating, Graphite speciale vel indicem pretiosum, electronicam tuam nobis relinque et intra 24 horas erimus.
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