Pii Carbide Coating

VeTek Semiconductor speciale in productione ultra purum Siliconis Carbide productorum Coating, hae tunicae ad graphites, ceramicos et metalla refractoria applicanda destinantur.

Nostrae puritatis altae coatinges praesertim in usu in semiconductoribus et in industriis electronicis iaculis sunt. Pro tutelae laganum baiulum, susceptores et elementa calefacientia inserviunt, ea custodiendo a ambitus mordax et reactiva, quae in processibus occurrunt, ut MOCVD et EPI. Hi processus integrales sunt processus lagani et fabrica fabricandi. Accedit, nostrae membranae aptae sunt applicationibus in fornacibus vacuo et calefactione exempli, ubi summus vacuum, reactivum et oxygenii ambitus offendit.

In VeTek Semiconductor, solutionem comprehensivam offerimus cum facultatibus machinarum machinarum provectorum. Hoc efficit ut basium componentium utentes graphite, ceramico, vel refractariis metallis fabricare, ac ceramicam SiC vel TaC coatings in aedibus adhibere possimus. Etiam operas efficiens praebemus ad partes suppeditatas, ut flexibilitas ad diversas necessitates occurrat.

Nostri Silicon Carbide Productorum Coating late usi sunt in epitaxy Si, epitaxy SiC, systema MOCVD, RTP/RTA processus, processus engraving, processus ICP/PSS engraving, processus variarum LED generum, inter caeruleum et viridem LED, UV LED et profunde UV DUXERIT etc., quod aptatur instrumentis ex LPE, Aixtron, Veeco, Nuflare, TEL, ASM, Annealsys, TSI et sic porro.

Reactor partes facere possumus;

Pii Carbide Coing multa singularia commoda:

Silicon Carbide Coating several unique advantages

VeTek Semiconductor Silicon Carbide Coating Parameter

Basicae physicae proprietates CVD SiC coating
Property	Typical Value
Crystal Structure	FCC β Phase polycrystallina, maxime (111) ordinatur
Sic coating densitas	3.21 g/cm³
Sic coatingHardness	MMD Vickers duritiem 500g onus
Frumenti amplitudo	2~10μm
Puritas chemica	99.99995%
Calor Capacity	640 J·kg^-1·K^-1
Sublimatio Temperature	2700℃
Flexurae Fortitudo	415 MPa RT 4-punctum
Modulus	430 Gpa 4pt bend, 1300℃
Scelerisque Conductivity	300W·m^-1·K^-1
Scelerisque Expansion (CTE)	4.5×10-6K^-1

CVD SIC CRYSTALLOS STRUCTURA

CVD SIC FILM CRYSTAL STRUCTURE

Silicon Carbide obductis Epi susceptor SiC Coating Wafer Portitorem SiC obductis Satellite operculum MOCVD CVD SiC Coating Wafer Epi Susceptor CVD SiC coating Heating Elementum Aixtron Satellite laganum carrier SiC Coating Epi susceptor SiC coating halfmoon graphite parts

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SiC coating Monocrystallini Pii epitaxial lance

Monocrystalline Silicon epitaxial Tray est momenti accessorium in monocrystalline Silicon epitaxial incrementum fornacem, ensuring minimam pollutio et firmum epitaxial incrementum elit. Vetek Semiconductor est Sicum monocrystalline Silicon epitaxial lance habet ultra-diu muneris vitae et praebet varietate customization options. Vetek semiconductor vultus deinceps ad decet tuum diu-term socium in Sinis.

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Solidum sic wafer carrier

Vetek Semiconductor solidum sicca sicca carrier est disposito ad altum temperatus et corrosio repugnant environments in semiconductor epitaxial processus et apta omnium genera laganum vestibulum processus cum excelsum pura requisita. Vetek Semiconductor est a ducens laganum carrier elit in Sina et vultus deinceps ad decore vestri diu term particeps in semiconductor industria.

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Sic coated satellite operimentum in Mocvd

Sic coated satellite operimentum in Mocvd ludit per irreparabile munus in cursus summus qualitas epitaxial incrementum in wafers propter eius maxime altum temperatus resistentia, excellens resistentia et outstanding outstanding resistentia.

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Solidum sic discus informibus imber caput

Vetek Semiconductor est ducens Semiconductor apparatu Manufacturer in Sina et professional manufacturer et elit solidum sic disco informibus imber caput. Nostrum pervideo figura imber caput est late in tenuis film depositione productio ut CVD processus ut uniformis distribution of reaction Gas et unus ex Core components of CVD fornace.

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Cvd sic coarta lagana Berin Holder

CVD sic coarta lagam farrem possessor est key pars epitaxial incrementum fornacem, late in Mocvd epitaxial incrementum Furnorum. Vetek Semiconductor providet te altus customized products. Non refert quid tibi necessitates sunt in CVD sic coated lagam Berin Holder, grata ad consulere nobis.

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Cvd sic coating dolium susceptos

VeTek Semiconductor CVD SiC coating barrel susceptor is the core component of the barrel type epitaxial furnace.With the help of CVD SiC coating barrel susceptor, the quantity and quality of epitaxial growth are greatly improved.VeTek Semiconductor is a professional manufacturer and supplier of SiC Coated Barrel Susceptor, and is at the leading level in China and even in the World.Vetek Semiconductor vultus deinceps ad constituendum proxima cooperantem necessitudinem cum te in semiconductor industria.

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Sicut professionalis {LXXVII} Manufacturer et elit in Sina, habemus nostram officinam. Utrum vos postulo customized servicia in occursum specifica necessitatibus vestris regione vel volunt emere provectus et durabile {LXXVII} in Sina, vos potest relinquere nos nuntium.

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+86-579-87223657
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Pii Carbide Coating

Reactor partes facere possumus;

Pii Carbide Coing multa singularia commoda:

VeTek Semiconductor Silicon Carbide Coating Parameter

CVD SIC CRYSTALLOS STRUCTURA

SiC coating Monocrystallini Pii epitaxial lance

Solidum sic wafer carrier

Sic coated satellite operimentum in Mocvd

Solidum sic discus informibus imber caput

Cvd sic coarta lagana Berin Holder

Cvd sic coating dolium susceptos

Mitte Inquisitionem

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De nobis

Products

Nobis loquere

Phone

Fax

E-mail

Oratio