CMP poliendo Slurry

CMP slurry expolitio (Chemica Mechanica, Slurry politura) summus effectus est materia in fabricandis semiconductoribus et in processu materiali praecisione adhibita. Core munus eius est consequi subtilitatem et expolitionem superficiei materialis sub synergistic effectu corrosionis chemicae et stridor mechanicae ut occurrat planicii et superficiei qualitatis requisitis in gradu Nano. Tuam porro consultationem exspecto.

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Veteksemicon's CMP slurriam expolitio maxime adhibetur ut laesura expolitio in CMP chemica mechanica slurry expolitio ad materias semiconductores planariandas. Habet haec commoda;

● Sponte aptabilis particula diametri et gradus aggregationis particulae;
● Particulae sunt monodispersae et particulae magnitudo uniformis distributio;
● Ratio dissipationis stabilis est;
● Massa productionis magna est, et parva differentia est inter batches;
● Non est facile condensare et componere.

Facis Indicatores pro Ultra-High Purity Series Products

Parameter	Unitasas	Facis Indicatores pro Ultra-High Purity Series Products
Parameter	Unitasas	UPXY-1	UPXY-2	UPXY-3	UPXY-4	UPXY-5	UPXY-6	UPXY-7
Mediocris Silica particula Location	nm	35±5	45±5	65±5	75±5	85±5	100±5	120±5
Nanoparticle Size Distribution (PDI)	1	<0.15	<0.15	<0.15	<0.15	<0.15	<0.15	<0.15
Solutio pH	1	7.2-7.4	7.2-7.4	7.2-7.4	7.2-7.4	7.2-7.4	7.2-7.4	7.2-7.4
Firmus Content	%	20.5±0.5	20.5±0.5	20.5±0.5	20.5±0.5	20.5±0.5	20.5±0.5	20.5±0.5
Aspectus	--	Caeruleus	Blue	White	Off-White	Off-White	Off-White	Off-White
Particulum Morphologiae X	X：S- pherical；B- Curved；P- eros informibus-T- Bulbous；C- Catenae-sicut (congregato statu)
Stabiliens Iones	Organicum / Inorganicum Amines
Rudis Material Y	Y：M-TMOS；E-TEOS；ME-TMOS+TEOS；EM-TEOS+TMOS
Metal Impurity Content	≤ 300ppb

Perficientur Specifications pro High-purity Series Products

Parameter
Unitasas
Perficientur Specifications pro High-purity Series Products

WGXY-1Z WGXY-2Z
WGXY-3Z
WGXY-4Z
WGXY-5Z
WGXY-6Z
WGXY-7Z

Mediocris Silica particula Location
nm
35±5
45±5
65±5
75±5
85±5
100±5
120±5

Nanoparticle Size Distribution (PDI)
1 <0.15
<0.15
<0.15
<0.15
<0.15
<0.15
<0.15

Solutio pH
1 9.5±0.2
9.5±0.2
9.5±0.2
9.5±0.2
9.5±0.2
9.5±0.2
9.5±0.2

Firmus Content
% 30-40 30-40
30-40
30-40
30-40
30-40
30-40

Aspectus
--
Caeruleus
Blue
White
Off-White
Off-White
Off-White
Off-White

Particulum Morphologiae X
X：S- pherical；B- Curved；P- eros informibus-T- Bulbous；C- Catenae-sicut (congregato statu)

Stabiliens Iones
M: Organic amine, K: potassium hydroxide, N: Sodium hydroxide, vel alia components

Metal Impurity Content
Z: High-purity Series (H Series≤1ppm;L Series≤10ppm); Latin Series (M Series ≤300ppm)