Products
TaC Coated Graphite Susceptor
  • TaC Coated Graphite SusceptorTaC Coated Graphite Susceptor

TaC Coated Graphite Susceptor

VeTek Semiconductoris TaC Coated Graphite Susceptor utitur depositione vaporum chemicorum (CVD) methodo comparandi tantalum carbidam in superficie partium graphitarum efficiens. Hic processus est perfectissimus et optimus efficiens proprietates. TaC Coated Graphite Susceptor vitam graphitatam extendere potest, migrationem graphitarum immunditiarum inhibere, et epitaxiae qualitatem curare. Exspectamus inquisitionem tuam.

Vos autem recepistis ad nos ad officinas Vestek semiconductor emere ad tardus venditionis, humilis pretium et summus qualitas Tac iactaret graphite susceptator. Expectamus cooperantem vobiscum.

Tantalum carbide ceramic material melting point up to 3880℃, is a high melting point and good chemical stability of the compound, its high temperature environment can still maintain stable performance, in addition, it also has high temperature resistance, chemical corrosion resistance, good chemical Et mechanica compatibility cum carbon materiae et alia characteres, faciens idealis graphite substrati tutela coating materia. Tantalum carbide coating potest efficaciter praesidio graphite components a potentia calidum ammonia, hydrogenii et Silicon vapor et conflatile metallum in dura usum environment, significantly extend in ministerium vitae graphite, et inhibere migrationem vitae in graphite, et inhibere migratio in migrari in graphite et inhibere migratio in migrationi in migrari, et inhibere migratio in graphite et inhibere migratio in migrationi in migrari, et inhibere migratio in migrari in graphite et inhibere migratio in migratione in migrari in migrationi, inhibere migratio in graphite Crystalli et qualis est maxime in Crystalli incrementum scriptor maxime in infectum Ceramic processus.

Chemical vapor depositione (CVD) est maxime mature et meliorem praeparatio modum pro tantalis carbide coating super superficiem Graphite.


CVD TaC Coating Methodus pro TaC Coated Graphite Susceptor:

CVD TaC Coating Method for TaC Coated Graphite Susceptor

Processus coatingis utitur TaCl5 et propylene ut fonte carbonis et fonte tantali respective, et argon ut tabellarius gas ut tantalum vaporem pentachloridum in cameram reactionem post gasificationem caliditatem caliditatem afferat. Sub clypeo temperatura et pressione, vapor praecursoris materia in superficie graphitae partis adsumitur, et series chemicae motus complexus ut compositione et compositione fontis carbonis et fontis Tantali occurrunt. Eodem tempore series reactionum superficierum sicut diffusio praecursoris et desorptionis per-productorum implicatur. Denique stratum densum tutelae in superficie partis graphitae formatur, quae partem graphitam tuetur ne stabilis sit sub extremis condicionibus environmental. Applicatio missionum materiae graphite signanter dilatatur.


Product parametri Tac iactaret Graphite susceptator:

Corporalis proprietatibus TaC coating
Densitas 14.3 (g/cm³)
Specifica emissivity 0.3
Thermal expansion coefficient 6.3x10-6/ K
Duritia (HK) MM HK
Resistentia I × X-5Ohm * cm
Scelerisque status
Graphite magnitudine mutationes -10~-20um
Crassitudo coating ≥20um typical valorem (35um ± 10um)


Productio officinae:

VeTek Semiconductor Production Shop


Overview of the semiconductor chip epitaxy industry catena:

Overview of the semiconductor chip epitaxy industry chain


Hot Tags: TaC Coated Graphite Susceptor
Mitte Inquisitionem
Contactus info
Percontationes de Silicon Carbide Coating, Tantalum Carbide Coating, Graphite speciale vel indicem pretiosum, electronicam tuam nobis relinque et intra 24 horas erimus.
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept