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Tantalum carbide tunicas operimentum
  • Tantalum carbide tunicas operimentumTantalum carbide tunicas operimentum

Tantalum carbide tunicas operimentum

Vetek Semiconductor est ducens Tantalum carbide linuit operimentum manufacturer et innovator in china.we sunt specialized in Tac et sic coating pro multis years.our products habere corrosio resistentia, princeps vires. Expectamus ad becoming vestri diu-term socium in china.welcome ad consulere aliquando.

Reperio a ingens lectio de Tantalum carbide iactaret operimentum de Sina ad Vetek Semiconductor. Provide professional post-Sales servitium et ius price, vultus deinceps ad cooperation.the Tantalum carbide tunicas operimentum developed by Vetek Semiconductor est accessorius specie disposito ad aixtron G10 Mocvd vestibulum qualitas. Hoc est meticumque ficti per altus-qualitas materiae et fabricari cum præcognactu, cursus praestantes perficientur et reliability pro metallum-organicum eget vapor depositione (Mocvd) processibus.


Construitur cum Graphite substratum iactaret cum eget vapor depositione (CVD) Tantalum carbide (Tac), Tantalum carbide tunicas operimentum offert offert eximia scelerisque stabilitatem, princeps castitatis et resistentia elevari temperaturis. Hoc unique compositum de materiae praebet certa solutio ad postulat operational condiciones in Mocvd ratio.


Et Tantalum carbide tunicas operimentum est customizable ad accommodare variis semiconductor lagam magnitudinum, faciens idoneam ad diversas productio requisita. Et robust constructione est specie machinator ut resistere ad challenging Mocvd environment, ensuring diu-perpetua perficientur et obscuratis downtime et sustentacionem sumptibus consociata cum lagam carriers et susceptores.


Per incorporating Tac operculum in Aixtron G10 Mucvd ratio, semiconductor artifices potest consequi altiorem efficientiam et superior eventus. Et eximia scelerisque stabilitatem, compatibility cum diversis laganum magnitudinum et reliable perficientur planetarum orbis facere quod adeptus est ad optimizing productio efficientiam et pervenit outstanding eventus in Mocvd processus.



Product Parameter de Tantalum Carbide Cover Cover

Physica proprietatibus Tac coating
Densitas 14.3 (G / CM³)
Specifica emissivity 0.3
Thermal expansion coefficient 6.3 X-6/ K
Duritia (HK) MM HK
Resistentia I × X-5Ohm * cm
Scelerisque stabilitatem
Graphite magnitudine mutationes -10 ~ -20um
CONGRESSUS ≥20um typical valorem (35um ± 10um)


Wafer perficientur post usura nostrorum components:

the Wafer performance after using our components


Servo Semiconductor:

Tantalum Carbide Coated Cover shops


Overview de semiconductor chip epitaxy industria catholica:

Overview of the semiconductor chip epitaxy industry chain


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