SIC coating Ald susceptator

Et semiconductorSIC coating Ald susceptatorPlays a vitalis partes in atomica iacuit depositione (Ald) Processus. Et precise temperatus imperium, uniformis Gas distribution, princeps eget resistentia et optimum scelerisque conductivity ensure uniformitatem et altum qualitas film depositione processus. Si vis scire magis, vos can consulere nos statim et nos respondeo in tempore!

Precise temperatus imperium:

SIC coating Ald susceptator plerumque habet summus praecisione temperatus imperium ratio. Non potest ponere uniformis temperatus environment in depositione processus, quae est pendet ad invigilandum et uniformitatem et qualis est film.

Uniformis Gas distribution:

Et optimized consilio de sic coating Ald susceptator ensures in uniformis distribution of Gas in Ald depositione processus. Structuram plerumque includit multiplex rotating movens partes promovere uniformis coverage reactivum vapores per totum laganum superficiem.

Altum chemical resistentia:

Cum Ald processum involves varietate eget vapores, sic coating Ald susceptator est plerumque ex corrosio repugnans materiae (ut platinum, Ceramicarum aut summus puritate) resistere environments eget.

Optimum scelerisque conductivity:

Ut efficaciter mores calor et ponere firmum depositione temperatus, sic coating Ald susceptatores plerumque uti princeps scelerisque conductivity materiae. Hoc adjuvat vitare loci overheating et inaequaliter deposition.

Basic physica proprietatibus CVD sic coating:

Productio shops:

Overview de semiconductor chip epitaxy industria catholica：