Industria News

Hoc articulum analyzes in productum characteres et application missionibus de Tantalum carbide coating et Silicon carbide coating ex multa prospectus.

Tenues film depositione est vitalis in chip vestibulum, partum Micro fabrica depositing films sub I micron densissima per CVD, Ald, aut PVD. Haec processus aedificare semiconductor components per alterna PROLIXUS et insulating films.

Et semiconductor vestibulum processus involves octo gradibus: Wafer Processus, oxidatio, Lithography, etching, tenuis film depositione, internonnection, testis et packaging. Silicon ex Arena est processionaliter in wafers, oxidized, mentis, et etched in summus praecisione circuits.

Hic articulus describitur, qui ductum subiectum est maxima applicationem sapphiri, tum pelagus modos parare sapphirus crystallis, crescente sapphiri crystallis per CZropulski modum, crescente sapphirus per a ducto per modum, crescente sapphiri per auctum per modum, crescente sapphiri per auctum per auctum modum.

In articulus est temperatus gradiente in uno-crystal fornacem. Covers in static et dynamic calor agros per crystal incrementum, in solidum-liquidum interface, et temperatus gradiente in partes in solidificatione.

Et Taiko processum Triticum Silicon Wafers per suam principiis, technica commoda et processum origins.