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Principia et technology de physica vapor depositione coating (1/2) - Veteec Semiconductor24 2024-09

Principia et technology de physica vapor depositione coating (1/2) - Veteec Semiconductor

Vacuum coating includit film materia vaporization, vacuo translationem et tenuis film incrementum. Secundum diversas film materia vaporization modi et transportation processus, vacuum coating potest dividitur in duo genera: PVD et CVD.
Quid purus Graphite? - Vetek Semiconductor23 2024-09

Quid purus Graphite? - Vetek Semiconductor

Hoc articulum describitur in physica parametri et productum characteres de Veteec Semiconductor scriptor Porae Graphite, tum sua propria applications in semiconductor processus.
Quid interest inter Silicon carbide et Tantalum carbide coatings?19 2024-09

Quid interest inter Silicon carbide et Tantalum carbide coatings?

Hoc articulum analyzes in productum characteres et application missionibus de Tantalum carbide coating et Silicon carbide coating ex multa prospectus.
A completum explicandum de chip vestibulum processus (2/2) a laganum ad packaging et temptationis18 2024-09

A completum explicandum de chip vestibulum processus (2/2) a laganum ad packaging et temptationis

Tenues film depositione est vitalis in chip vestibulum, partum Micro fabrica depositing films sub I micron densissima per CVD, Ald, aut PVD. Haec processus aedificare semiconductor components per alterna PROLIXUS et insulating films.
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