Products
CVD Tantalum Carbide (TaC) Susceptor Coated
  • CVD Tantalum Carbide (TaC) Susceptor CoatedCVD Tantalum Carbide (TaC) Susceptor Coated
  • CVD Tantalum Carbide (TaC) Susceptor CoatedCVD Tantalum Carbide (TaC) Susceptor Coated
  • CVD Tantalum Carbide (TaC) Susceptor CoatedCVD Tantalum Carbide (TaC) Susceptor Coated

CVD Tantalum Carbide (TaC) Susceptor Coated

VETEK CVD TaC Susceptor Coated Susceptor est summus puritatis isostaticae graphitae subiectae cum carbide densa CVD tantalum (TaC) efficiens ut stabilitatem eximiam thermarum, corrosionem resistentiae liberaret, et particulam humilem generationi ad semiconductorem epitaxiam posceret. SiC, GaN, et AlN epitaxiale incrementum destinatum est, contaminationem extenuat, laganum temperamentum uniformitatem meliorat, et in processibus MOCVD et CVD processibus componentibus vitam exercet.

Key Features

Summus Temperature Stabilitas: stabilis obtinet effectus sub diuturnis conditionibus processus summus temperatus.
Corrosio Resistentia: densa TaC efficiens efficaciam tutelam praebet contra vapores corrosivos processus.
Generatio particulae humilis: Condensa structurae structurae contagionem in epitaxiali augmento minuere adiuvat.
Optima Uniformitas Thermal:   sustinet uniformem calorem distributio pro processu melioris constantiae.
Longa servitii Vita: Maximum lapsum resistentia ad sustentationem redactos et cyclos longiores operandos confert.


Applications

Typicam applicationes includit:

• SiC Epitaxial Augmentum

MOCVD • GaN Epitaxy

• AlN Epitaxial Augmentum

• Tertia-generatio Semiconductor Vestibulum

• Summus Potestas Electronics

• RF Devices

• MicroLED productione

• Research and Gubernator Productio Systems


Compatible Equipment

Vestibulum compatible includit:

• Aixtron

• LPE

• Veeco

• AMEC

• NuFlare

• Custom CVD & MOCVD Reactors


Etiam available:

• laganum Carriers

• Planetarii Susceptores

• Ferocactus Susceptores

• Rotatione Orbis

• Half-luna Parts

• Cover Plates

• Graphite Conventibus

• Custom Scelerisque Field Components


Technical Specifications

Substratum Material

Summus puritas Isostatic Graphite

Coing Material

CVD Tantalum Carbide (TaC)

Coing Crassitudo
20-40 µm (Mos)
Coing Purity
Usque ad 99,9995%
Maximum Opus Temperature

>2000°C (Inert Atmosphere)

Densitas
14.3 g/cm³
duritia
~2000 HK
Scelerisque Expansion Coefficient
6.3 10⁻⁶/K
Resistivity electrica
1 10⁻⁵ Ω·cm
Praesto Amplitudo
nativus
Typical Applications
SiC, GaN, AlN Epitaxy

Frequenter Interrogata

1. What is a CVD TaC Coated Susceptor?

Summus puritas graphite conservata a denso CVD TaC coatingis adhibita ut laganum per incrementum epitaxial.

2. Quare uti TaC coaperculsa receptis pro SIC efficiens?

TaC resistentiam temperaturae altiorem, superior stabilitatem chemicam, et vitam serviendi longiorem praebet.

3.Quod semiconductor processuum uti TaC-coated susceptores?

SiC epitaxia, GaN MOCVD, AlN epitaxia, aliaeque processuum incrementi crystalli summus temperatus.

4. Can VETEK fabricare susceptores nativus?

Ita. Lorem designationes nativus delineatas providemus et processu exigentias.

5. Quod brands reactor sustentantur?

Aixtron, LPE, Veeco, AMEC, NuFlare, et alia systemata amet.


Hot Tags: CVD TaC Coated Susceptor, TaC Coated Graphite Susceptor, Semiconductor Susceptor, SiC Epitaxy Susceptor, MOCVD Susceptor, Graphite Wafer Carrier, Tantalum Carbide Coating, Epitaxial Susceptor, Semiconductor Parts Graphite
Mitte Inquisitionem
Contactus info
For inquiries about Silicon Carbide Coating, Tantalum Carbide Coating, Special Graphite or price list, please leave your email to us and we will be in touch within 24 hours.
X
Crusulis utimur ut meliorem experientiam pasco tibi praebeamus, situm negotiationis et personalize contentus analyse. Hoc situ utendo, ad nostrum crustulorum usum consentis.Privacy Policy