Products
CVD Tac coating Crucible
  • CVD Tac coating CrucibleCVD Tac coating Crucible

CVD Tac coating Crucible

Vetek Semiconductor est professional manufacturer et ducem CVD Tac coating Crucible Products in Sina. CVD Tac coating Crucible fundatur super Tantalum Carbon (Tac) coating. Et Tantalum Carbon coating est aequaliter operuit super superficiem de chemical vapor depositione (cvd) processu ad augendae et calor resistentia et corrosio resistentia. Est materia instrumentum specialiter in altum caliditas summa environments. Receperint tua porro consultatio.

Tac coating gyrationis susceptator ludit a key munus in altum temperatus depositionem processibus ut CVD et MBE et est magna component ad laganum processus in semiconductor vestibulum. Inter eosTac coatingHabet optimum summus temperatus resistentia, corrosio resistentia et eget stabilitatem, quod ensures princeps praecisione et alta qualis durante lagestis processus.


CVD Tac coating Crucible plerumque consistit de Tac coating etGraphitesubiecti. Inter eos, Tac est altus liquescens illud Ceramic materia cum liquescens punctum ad MMMDCCCLXXX c. Hoc est maxime princeps duritia (Vickers duritia usque ad MM HV), chemical corrosio resistentia et fortis oxidatio resistentia. Ideo Tac coating est optimum summus temperatus repugnant materia in semiconductor processus technology.

In graphite subiectis habet bonum scelerisque conductivity (Thermal conductivity est circa XXI w / m K) et optimum mechanica stabilitatem. Hoc proprium decernit quod graphite fit idealis coatingsubiecti.


CVD Tac coating Crucible est maxime in sequentibus semiconductor processus technologies:


Wafer vestibulum: Vetek Semiconductor CVD Tac coating Crucible habet optimum summus temperatus resistentia (liquescens usque ad MMMDCCCLXXX ° C) et corrosio resistentia, ita saepe usus est in key wafer depositione (CVD) et epitaxial incrementum. Combined cum uber est optimum structural stabilitatem in ultra-altum temperatus environments, id ensures quod apparatu potest operari stabiliter diu sub maxime dura conditionibus, ita efficacius improving productio et qualitas effectivi.


Epitaxial incrementum processusIn Epitaxial processibus utChemical vapor depositione (CVD)Et Molecular trabem EPITAXY (MBE), CVD Tac coating CRUCIPLE ludit a key munus in portandum. Et Tac coating non solum ponere excelsum puritatem materiae sub extrema temperatus et corrosiue atmosphaera, sed etiam efficaciter prohibet contaminationem reactants in materia et corrosio processu et uber consistentia.


Sicut Sinis scriptor ducens CVD Tac coating Crucibture Manufacturer et Dux, Vetek Semiconductor potest providere customized products et technica officia secundum tua apparatu et processus requisita. Non sincere spes facti vestri diu term particeps in Sinis.


Tantalum carbide (Tac) coating in microscopic crucem-sectioni


Tantalum carbide (TaC) coating on a microscopic cross-section 1Tantalum carbide (TaC) coating on a microscopic cross-section 2Tantalum carbide (TaC) coating on a microscopic cross-section 3Tantalum carbide (TaC) coating on a microscopic cross-section 4


Physica proprietatibus Tac coating


Physica proprietatibus Tac coating
Densitas
14.3 (G / CM³)
Specifica emissivity
0.3
Thermal expansion coefficient
6.3 * X-6/ K
Duritia (HK)
MM HK
Resistentia
I × X-5Ohm * cm
Scelerisque stabilitatem

Graphite magnitudine mutationes
-10 ~ -20um
CONGRESSUS
≥20um typical valorem (35um ± 10um)


Et semiconductor CVD Tac coating Crucible officinae:


CVD TaC Coating Crucible shops



Hot Tags: CVD Tac coating Crucible
Mitte Inquisitionem
Contactus info
Percontationes de Silicon Carbide Coating, Tantalum Carbide Coating, Graphite speciale vel indicem pretiosum, electronicam tuam nobis relinque et intra 24 horas erimus.
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept