CVD Tac coating carrier

Vetek Semiconductor est professional princeps Sinis CVD Tac coating carrier, epitaxy susceptator;TaC Coated Graphite SusceptorManufacturer.

Per continua processum et materiam innovation Research, Vetek Semiconductor est CVD Tac coating carrier ludit a valde discrimine partes in epitaxial processus, maxime inter haec facies:

Substratum praesidii: CVD Tac coating carrier praebet optimum eget stabilitatem et scelerisque stabilitatem, efficaciter ne altum temperatus et murum vapores ex eroding subiectum et interiorem murum de reactore.

Scelerisque uniformitatem: Cui cum excelsum scelerisque conductivity de CVD Tac coating carrier, id ensures in uniformitatem temperatus distribution intra reactor, optimizes crystal qualitas et crassitudine uniformitatem epitaxial in ultima et ad perficientur consistency in ultima et ad ultima perficientur ad ultima in perficientur ad ultima in ultima ex perficientur consistency de ultima in perficientur ad ultima et ad ultima perficientur ad ultima in perficientur ad ultima et ad perficientur constantia de ultima uber.

Particula contamination imperium: Quia CVD Tac tunicas carriers have maxime humilis particula generationem rates, lenis superficies proprietatibus significantly reducere periculum particulae contaminationem, ita improving puritatem et in epitaxial incrementum.

Extended apparatu vitae: Combined cum optimum gerunt resistentia et corrosio resistentia CVD Tac coating carrier, significantly se extendit ministerium vitae reactionem cubiculum components, reduces apparatu et sustentacionem costs, et emendat productionem efficientiam.

Combining est supra, Vetisek Semiconductor est cvd Tac coating carrier non solum amplio in reliability processus et qualis est productum in epitaxial incrementum processus, sed etiam praebet sumptus-effective solutio ad semiconductor vestibulum.

Tantalum carbide coating in microscopic Crucis sectioni:

Physica proprietatibus CVD Tac coating carrier:

Vetek Semiconductor cvd sic coating productio tabernam: