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PSS Etching Portitorem laminam ad Semiconductor
  • PSS Etching Portitorem laminam ad SemiconductorPSS Etching Portitorem laminam ad Semiconductor
  • PSS Etching Portitorem laminam ad SemiconductorPSS Etching Portitorem laminam ad Semiconductor

PSS Etching Portitorem laminam ad Semiconductor

Vetek Semiconductor est PSCHING PRAETERATOR laminam ad Semiconductor est summus qualitas, ultra-purus graphite carrier disposito laganum pertractatio processibus. Nostri carriers habere optimum perficientur et potest praestare etiam in dura environments, princeps temperaturis et dura eget elit conditionibus. Noster products sunt late in multis Europae et American fora et expectamus ad decet tuum diu-term socium in china.you sunt grata ad Sina ad visitare nostri Factory et discere de nostra technology et products.
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Sicut ducens professional manufacturer in agro, Vetec Semiconductor est delectatur ad offer te vertice-SCARIFICIUS PSSCHING PRAETERATOR laminis tailored specie ad semiconductor industria.


Nostrum PSS etching Portitorium laminis pro Semiconductors sunt altus specialioribus components quod sunt necessaria in Plasma Source Spectroscopy (PSS) Etching elit in semiconductor operis regni. Haec laminas assumere a Pivotal partes in etching processus. Et praebere firmum firmamentum et curare lenis translationem de semiconductor lagana, quae est crucial pro praecisione et qualitate etching operationem.


Nos autem ad nos ad nos invitare ad nos inquires. Nos es semper paratus ut adiuvaret et providere magis detailed notitia de nostris outstanding products.




PSS Etching Portitorem laminam ad SemiconductorKey Features:

● Precision DesignEt carrier laminam est machinatum cum precise dimensiones et superficiem plane ad curare uniformis et consistent etching per semiconductor lagana. Hoc praebet stabulum et imperium suggestu ad lagana, permittens ad accurate et fideliora etching results.

● Plasma resistentiaEt carrier laminam exhibet optimum resistentiam ad plasma usus est in Etching processus. Relinquitur autem inficit a reactive vapores et summus industria plasma, cursus dilatur ministerium vitae et consistent perficientur.

● DECRECTIVIVUS: De carrier laminam features princeps scelerisque conductivity ad effective dissipare calor generatae in etching processus. Hoc adjuvat in maintaining meliorem temperatus imperium et prohibet overheating de semiconductor wafers.

● CompatibilityEt PSS Etching Portitorem laminam est disposito esse compatible cum variis semiconductor lagam magnitudinum communiter in industria, ensuring versatility et otium of usu per diversas vestibulum processus.


Product Parameter PSS Etching Portitorem laminam ad Semiconductor

Basic physica proprietatibus CVD sic coating
Res Typical valorem
Crystal structure FCC β tempus Polycrystalline, maxime (CXI) Oriented
Sic coating density 3,21 G / CM³
CVD sic coating duritia MMD Vickers Duritia (500g Load)
Frumea magnitudine II ~ X μm
Chemical castitas 99,99995%
Calor DCXL J · k-1· K-1
Sublimation Temperatus MMDCC ℃
Flacalis fortitudinem CDXV MPA Rt IV-Point
Young 's modulo CDXXX GPA 4pt flectere, MCCC ℃
Scelerisque conductivity 300W · M-1· K-1
Thermal Expansion (CTE) 4.5 × X-6K-1



Et semiconductor PSS Etching Portitorem laminam ad SemiconductorTabernam productio

SiC Graphite substrateCVD TaC coating cover testSilicon carbide ceramic processingEPI process equipment



Overview de Semiconductor chip epitaxy Industry catenae:

SiC Epitaxy Si Epitaxy GaN Epitaxy

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Percontationes de Silicon Carbide Coating, Tantalum Carbide Coating, Graphite speciale vel indicem pretiosum, electronicam tuam nobis relinque et intra 24 horas erimus.
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