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Quid est differentia inter Silicon Carbide (sic) et Gallium Nitride (Gan) Applications? - Vetek Semiconductor10 2024-10

Quid est differentia inter Silicon Carbide (sic) et Gallium Nitride (Gan) Applications? - Vetek Semiconductor

SiC et GaN latae sunt fasciae semiconductores cum commodis super Pii, ut superiores voltages naufragii, velocitates mutandi et efficacia superior. SiC melius est altae intentionis, altae potentiae applicationes ex superiore scelerisque conductivity, dum GaN in applicationibus altioribus frequentia propter mobilitatem electronico superiori praestat.
Principia et technology de physica vapor depositione (PVD) coating (2/2) - Vetek Semiconductor24 2024-09

Principia et technology de physica vapor depositione (PVD) coating (2/2) - Vetek Semiconductor

Evaporatio electronica trabes est valde efficax et late methodus efficiens ad resistentiam calefactionis comparata, quae materiam evaporationis cum trabis electronico calefacit, eam faciens ut adiuuatur et condenset in tenue cinematographicum.
Principia et technology de physica vapor depositione coating (1/2) - Veteec Semiconductor24 2024-09

Principia et technology de physica vapor depositione coating (1/2) - Veteec Semiconductor

Vacuum coating includit film materia vaporization, vacuo translationem et tenuis film incrementum. Secundum diversas film materia vaporization modi et transportation processus, vacuum coating potest dividitur in duo genera: PVD et CVD.
Quid purus Graphite? - Vetek Semiconductor23 2024-09

Quid purus Graphite? - Vetek Semiconductor

Hoc articulum describitur in physica parametri et productum characteres de Veteec Semiconductor scriptor Porae Graphite, tum sua propria applications in semiconductor processus.
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