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Vacuum coating includit film materia vaporization, vacuo translationem et tenuis film incrementum. Secundum diversas film materia vaporization modi et transportation processus, vacuum coating potest dividitur in duo genera: PVD et CVD.

Hoc articulum describitur in physica parametri et productum characteres de Veteec Semiconductor scriptor Porae Graphite, tum sua propria applications in semiconductor processus.

Hoc articulum analyzes in productum characteres et application missionibus de Tantalum carbide coating et Silicon carbide coating ex multa prospectus.

Tenues film depositione est vitalis in chip vestibulum, partum Micro fabrica depositing films sub I micron densissima per CVD, Ald, aut PVD. Haec processus aedificare semiconductor components per alterna PROLIXUS et insulating films.

Et semiconductor vestibulum processus involves octo gradibus: Wafer Processus, oxidatio, Lithography, etching, tenuis film depositione, internonnection, testis et packaging. Silicon ex Arena est processionaliter in wafers, oxidized, mentis, et etched in summus praecisione circuits.

Hic articulus describitur, qui ductum subiectum est maxima applicationem sapphiri, tum pelagus modos parare sapphirus crystallis, crescente sapphiri crystallis per CZropulski modum, crescente sapphirus per a ducto per modum, crescente sapphiri per auctum per modum, crescente sapphiri per auctum per auctum modum.